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Effects of Pulse Bias Duty Cycle on Composition, Structure and Hardness of Ti Cu N Nanocomposite Films Deposited by Pulse Biased Arc Ion Plating

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Figure

Fig. 1Schematic diagram of the TRIO arc ion plating system.
Fig. 3XPS spectra of Cu 2p for the Ti­Cu­N films deposited at differentduty cycles.
Fig. 5The crystallite size of TiN in the Ti­Cu­N films as a function of(a) duty cycle and (b) Cu content.
Fig. 6Load-displacement nanoindentation curves of the Ti­Cu­N filmdeposited under a pulse bias voltage of ¹600 V.

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