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a-Si:H growth

Surface reactions during plasma enhanced chemical vapor deposition of silicon and silicon based dielectrics

Surface reactions during plasma enhanced chemical vapor deposition of silicon and silicon based dielectrics

... Si:H growth, there is a distribution of slightly different bond lengths and angles that result in a distribution of weak and strong Si-Si ...surface Si-Si ...surface Si-Si ...

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In situ growth and coalescence of He filled bi dimensional defects in Si by H supply

In situ growth and coalescence of He filled bi dimensional defects in Si by H supply

... of H into specific penny- shaped He-based defects can lead to the propagation and interaction of cracks under particular conditions of annealing, giving rise to the splitting of ...to H- platelets regarding ...

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Quasi radial growth of metal tube on si nanowires template

Quasi radial growth of metal tube on si nanowires template

... of Si sub- strates ( r : 1-10 Ω cm, n -type substrates for samples are shown in Figures 1, 2, 3, 4, 5, 6, 7a and 7b, and p -type substrates for samples are shown in Figure ...the Si nanowire templates used ...

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Electrochemical Deposition of Flower-Like Nickel Nanostructures on Well-Defined n-Si (111):H

Electrochemical Deposition of Flower-Like Nickel Nanostructures on Well-Defined n-Si (111):H

... n- Si(111) is perfectly uniform. When high growth rates are observed, it can be seen that, growth does not take place in preferential directions hence spherical nucleus are obtained ...the ...

6

MBE Growth of AlN Nanowires on Si Substrates by Aluminizing Nucleation

MBE Growth of AlN Nanowires on Si Substrates by Aluminizing Nucleation

... to Fig. 1b, c, the sample aluminized at higher temperature has more nucleation islands with smaller average diam- eter, hence leading to the increase of AlN NW density and decrease of the average diameter with ...

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Conjunctivitis-Otitis Syndrome

Conjunctivitis-Otitis Syndrome

... A heavy growth of H influenzae type B was isolated from conjunc tival as well as nasal cultures that were done si multaneously in all three patients (Table 1, family 20). In Fig 2 are sh[r] ...

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Construction of TiO2/Si Heterostructure by Nanoepitaxial Growth of Anatase-type TiO2

Construction of TiO2/Si Heterostructure by Nanoepitaxial Growth of Anatase-type TiO2

... titanium tetrachloride for 1 min. Then, they were washed in ultrasonic bath with DI water for 1 min. A clean process with ethanol solution was carried out before dipping the Si wafers into titanium tetrachloride ...

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Influences of H on the Adsorption of a Single Ag Atom on Si(111) 7 × 7 Surface

Influences of H on the Adsorption of a Single Ag Atom on Si(111) 7 × 7 Surface

... the H-terminated Si(111)-1 9 1 surfaces and diffusion of Ag on the H-terminated Si(111)-1 9 1 and clear Si(111)-1 9 1 surfaces have been studied experimentally and theoretically ...of ...

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Controlled growth of Si based heterostructure nanowires and their structural and electrical properties

Controlled growth of Si based heterostructure nanowires and their structural and electrical properties

... distance of 8 mm. A cross-section view of the backscat- tered electron images of the nanowires was collected by a Bruker photodiode-backscattered electron (PDBSE) de- tector. The TEM and HRTEM images of the nanowires ...

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Changes in B inhibitor and cytokinin levels in response to long wilting periods in grain sorghum at different growth stages : a thesis presented in partial fulfilment of the requirements for the degree of Master of Agricultural Science in Plant Science at

Changes in B inhibitor and cytokinin levels in response to long wilting periods in grain sorghum at different growth stages : a thesis presented in partial fulfilment of the requirements for the degree of Master of Agricultural Science in Plant Science at Massey University

... Growth response of wheat coleoptiles to chromatograJ>h sections ofthe acidic ether fractions f~o~ extracts-; of leaf of s or ghum plants taken during the boot to rJloom staage.. ireas si[r] ...

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Step-induced optical anisotropy of Si(111): H surfaces

Step-induced optical anisotropy of Si(111): H surfaces

... to Si 共 001 兲 surfaces, 5–8 due to their technological importance and their model character for semiconductor surface ...science. Si 共 113 兲 共 Ref. 7 兲 and Si 共 110 兲 :H surfaces 9 were ...

5

Growth and characterization of organic layers deposited on porous-patterned Si surface

Growth and characterization of organic layers deposited on porous-patterned Si surface

... patterned Si substrate was carried out from aqueous solution of thiamine diphosphide (TD) and metamizole sodium (MS) at room temperature during 100 min and 20 ...onto Si surface without preliminary ...

8

Controllable synthesis of branched ZnO/Si nanowire arrays with hierarchical structure

Controllable synthesis of branched ZnO/Si nanowire arrays with hierarchical structure

... the Si nanowire arrays can also be tailored by other parameters, such as etching period [28], solution concentration [29] and temperature [30], crystalline character of the sub- strates [30,31], as well as surface ...

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Mechanism of Vanadium Leaching during Surface Weathering of Basic Oxygen Furnace Steel Slag Blocks: A Microfocus X-ray Absorption Spectroscopy and Electron Microscopy Study

Mechanism of Vanadium Leaching during Surface Weathering of Basic Oxygen Furnace Steel Slag Blocks: A Microfocus X-ray Absorption Spectroscopy and Electron Microscopy Study

... SEM Microanalysis. SEM analysis showed that the center of slag blocks consists of an interlocking crystalline matrix (Figure 1). EDS mapping showed that each subregion within the matrix had relatively uniform composition ...

8

The Composition and Downward Vertical Transport of Particulate Phosphorus in the Cariaco Basin, Venezuela

The Composition and Downward Vertical Transport of Particulate Phosphorus in the Cariaco Basin, Venezuela

... on Si-face SiC and higher mobility, although the stacking of these films appears to be turbostratic rather than Bernal, promising for high mobility devices ...

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First Principles Study of the Band Gap Structure of Oxygen Passivated Silicon Nanonets

First Principles Study of the Band Gap Structure of Oxygen Passivated Silicon Nanonets

... of Si–O bond is much smaller than the SiSi bond, the distance between the silicon atoms which are linked by the same oxygen atom becomes much smaller in the Si–O– Si passivated ...the ...

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STEM Moiré Observation of Lattice Relaxed Germanium Grown on Silicon

STEM Moiré Observation of Lattice Relaxed Germanium Grown on Silicon

... In this study, we produced a low-dislocation-density Ge thin film onto Si sub- strate by MBE followed by microwave-hydrogen plasma heating. We precisely analyze the lattice-space distribution by using STEM moiré ...

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Effects of Strain Relaxation in SiGe Growth on Uniquely Oriented Si Substrates

Effects of Strain Relaxation in SiGe Growth on Uniquely Oriented Si Substrates

... because Si processing, which is portable to SiGe, is so well developed due to the semiconductor industry that imperfections in the substrates and the growth can in many cases be excluded from ...of ...

129

Kinetics of Si and Ge nanowires growth through electron beam evaporation

Kinetics of Si and Ge nanowires growth through electron beam evaporation

... evaporated Si or Ge atoms reaching the substrate interact with the surface atoms, bond with them, and start to ...NWs growth. In particular, the microscopic growth mechanisms governing the Si ...

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Epitaxial Ge Growth on Si(111) Covered with Ultrathin SiO2 Films

Epitaxial Ge Growth on Si(111) Covered with Ultrathin SiO2 Films

... The STM data show that the ratio of the top flat areas to the areas of other facets, inclined from (111), increases with decreasing the growth temperature from 550 to 360˚C. This occurs simultaneously with the ...

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