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low temperature molecular beam epitaxy

High temperature molecular beam epitaxy of hexagonal boron nitride layers

High temperature molecular beam epitaxy of hexagonal boron nitride layers

... to low accuracy of the SIMS measurements for such nanometer thick ...growth temperature below 1300 C must be attributed to the increase in the sticking coefficient of boron and therefore increase in the ...

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High temperature molecular beam epitaxy of hexagonal boron nitride with high active nitrogen fluxes

High temperature molecular beam epitaxy of hexagonal boron nitride with high active nitrogen fluxes

... source temperature of 1975 °C, growth time of 3 h and growth temperatures between 1080 °C to 1390 ...MBE temperature from 1080 °C to 1390 ...at low epitaxial temperatures but must be taken into ...

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Low Temperature Photoluminescence Measurement of Extremely Thin InGaAs/GaAs Multi Quantum Wells Grown by Molecular Beam Epitaxy

Low Temperature Photoluminescence Measurement of Extremely Thin InGaAs/GaAs Multi Quantum Wells Grown by Molecular Beam Epitaxy

... The rocking profiles were obtained using the Material Research Diffractometer. The incident X-ray beam of wavelength 1.5405980 A0 was produced at 10 mA and 45kV potential and passed through a four crystal ...

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Molecular beam epitaxy and properties of GaAsBi/GaAs quantum wells grown by molecular beam epitaxy: effect of thermal annealing

Molecular beam epitaxy and properties of GaAsBi/GaAs quantum wells grown by molecular beam epitaxy: effect of thermal annealing

... Dilute bismuth alloys grown on GaAs attract more and more attention because of their peculiar electronic properties. Adding bismuth to GaAs efficiently decreases the gap energy of this semiconductor [1] through a change ...

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Deep-level defects in n-type GaAsBi alloys grown by molecular beam epitaxy at low temperature and their influence on optical properties

Deep-level defects in n-type GaAsBi alloys grown by molecular beam epitaxy at low temperature and their influence on optical properties

... Electrical measurements. For electrical characterization, Au/Ge ohmic contacts were deposited on the whole back side of each sample, and annealing was performed at 350 °C in an Ar atmosphere for 5 min. Subsequently, ...

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Low phonon energy Nd:LaF3 channel waveguide lasers fabricated by molecular beam epitaxy

Low phonon energy Nd:LaF3 channel waveguide lasers fabricated by molecular beam epitaxy

... The MBE chamber used for these experiments is equipped with eight Knudsen effusion cells. For the thin films presented here, three cells were used loaded with CaF crystal, LaF crystal pieces, and NdF compacted powder, ...

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Deep ultraviolet emission in hexagonal boron nitride grown by high temperature molecular beam epitaxy

Deep ultraviolet emission in hexagonal boron nitride grown by high temperature molecular beam epitaxy

... two-lowest temperature samples grown on HOPG (figure 4(b)) is an extremely important observation as already pointed out ...the low- est temper ature hBN on HOPG samples shown in figure ...lowest ...

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Hexagonal boron nitride tunnel barriers grown on graphite by high temperature molecular beam epitaxy

Hexagonal boron nitride tunnel barriers grown on graphite by high temperature molecular beam epitaxy

... assess the electrical properties of the grown layers we have used cAFM to measure the resistance across the hBN layers using a metal coated cantilever and the HOPG substrate as electrodes. Figure 3(a,b) show spatially ...

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Silicon molecular beam epitaxy : doping and material aspects

Silicon molecular beam epitaxy : doping and material aspects

... too low to achieve this situation over any significant ...the temperature is ...sufficiently low, then place exchange at the interface would be too slow to prevent dopant atoms from being buried ...

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Composition and luminescence of AlInGaN layers grown by plasma-assisted molecular beam epitaxy

Composition and luminescence of AlInGaN layers grown by plasma-assisted molecular beam epitaxy

... room temperature 共RT兲 cathodoluminescence 共CL兲 spectroscopy using an electron probe microanalyzer ...the temperature varia- tions across the substrate and on correlations between the compositional data and ...

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The growth and evaluation of epilayers grown by silicon molecular beam epitaxy

The growth and evaluation of epilayers grown by silicon molecular beam epitaxy

... The method o f low temperature preparation to give an atom ically clean surface must therefore involve three processes: i Removal o f native oxide and contaminants ii Regrowth o f a thin[r] ...

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Characterization and density control of GaN nanodots on Si (111) by droplet epitaxy using plasma assisted molecular beam epitaxy

Characterization and density control of GaN nanodots on Si (111) by droplet epitaxy using plasma assisted molecular beam epitaxy

... droplet epitaxy method, and their density can be controlled from ...droplet epitaxy and then in situ annealing make higher-degree nitridation of GaN ...

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Molecular beam epitaxy of GaN1–xBix alloys with high bismuth content

Molecular beam epitaxy of GaN1–xBix alloys with high bismuth content

... After the growth we can observe clean surfaces for the layers grown under N-rich and close to stoichiometric conditions, but for samples grown under Ga-rich conditions we observe metal droplets at the edge of the ...

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Molecular beam epitaxy of highly mismatched N-rich GaNSb and InNAs alloys

Molecular beam epitaxy of highly mismatched N-rich GaNSb and InNAs alloys

... In recent years, we have performed significant investiga- tions on the growth and characterization of GaN-based HMAs. 4–7 In contrast, to the best of our knowledge no exper- imental data are available so far for ...

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Formation of Ga droplets on patterned GaAs (100) by molecular beam epitaxy

Formation of Ga droplets on patterned GaAs (100) by molecular beam epitaxy

... using molecular beam epitaxy ...droplet epitaxy (D-E) proposed by Koguchi et ...of low-dimensional epitaxial semicon- ductor QNSs ...

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Compositional variations in In0 5Ga0 5N nanorods grown by molecular beam epitaxy

Compositional variations in In0 5Ga0 5N nanorods grown by molecular beam epitaxy

... include decreasing material quality, due to high densities of threading and point defects, and reduced radiative recombi- nation of carriers due to high internal electric fi elds which result from growth of strained InGaN ...

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Growth of Inclined GaAs Nanowires by Molecular Beam Epitaxy: Theory and Experiment

Growth of Inclined GaAs Nanowires by Molecular Beam Epitaxy: Theory and Experiment

... the surface and 172–199 meV for the sidewall adatoms. To sum up, our results show that the diffusion of adatoms that first impinge the sidewalls has a tremendous effect on the growth rate. First, since the diffusivity of ...

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Dependence of the electrical and optical properties on growth interruption in AlAs/In0 53Ga0 47As/InAs resonant tunneling diodes

Dependence of the electrical and optical properties on growth interruption in AlAs/In0 53Ga0 47As/InAs resonant tunneling diodes

... Ohmic contacts were made using Ti/Pt/Au for the top and bottom contacts. In that case, the devices were con- nected to low-loss transmission lines by means of air- bridge interconnection which largely reduced ...

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Growth of GaN nanowall network on Si (111) substrate by molecular beam epitaxy

Growth of GaN nanowall network on Si (111) substrate by molecular beam epitaxy

... GaN nanowall network was epitaxially grown on Si (111) substrate by molecular beam epitaxy. GaN nanowalls overlap and interlace with one another, together with large numbers of holes, forming a ...

7

Material quality issues in Si and SiGe molecular beam epitaxy

Material quality issues in Si and SiGe molecular beam epitaxy

... Theoretical scattering rates in the SiGe 2DHG 99 Hall measurement system 105 Schematic band diagram of the SiGe 2DHG 105 Calculated carrier concentrations versus experiment 107 2DHG mobi[r] ...

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