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molecular beam epitaxy material

Silicon molecular beam epitaxy : doping and material aspects

Silicon molecular beam epitaxy : doping and material aspects

... electron beam evaporator for a time period comparable with pre-growth preparation, whilst keeping the substrate shutter closed ...electron beam evaporator), caused another large increase in the particulate ...

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Molecular beam epitaxy in the lithium-niobium-oxygen system

Molecular beam epitaxy in the lithium-niobium-oxygen system

... In the light of these comments, it must be asked whether the MBE technique offers any genuine competition to its main rivals: in particular, r.f. sputtering is now enjoying a degree of success for epitaxial LiN b03 ...

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Low phonon energy Nd:LaF3 channel waveguide lasers fabricated by molecular beam epitaxy

Low phonon energy Nd:LaF3 channel waveguide lasers fabricated by molecular beam epitaxy

... In this paper, we describe two methods for fabricating channel waveguides based on the MBE-grown LaF thin films. The channel geometry is required to give the lowest lasing thresholds and can also give a more circular ...

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Material quality issues in Si and SiGe molecular beam epitaxy

Material quality issues in Si and SiGe molecular beam epitaxy

... Theoretical scattering rates in the SiGe 2DHG 99 Hall measurement system 105 Schematic band diagram of the SiGe 2DHG 105 Calculated carrier concentrations versus experiment 107 2DHG mobi[r] ...

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Compositional variations in In0 5Ga0 5N nanorods grown by molecular beam epitaxy

Compositional variations in In0 5Ga0 5N nanorods grown by molecular beam epitaxy

... decreasing material quality, due to high densities of threading and point defects, and reduced radiative recombi- nation of carriers due to high internal electric fi elds which result from growth of strained InGaN ...

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Molecular beam epitaxy of highly mismatched N-rich GaNSb and InNAs alloys

Molecular beam epitaxy of highly mismatched N-rich GaNSb and InNAs alloys

... In recent years, we have performed significant investiga- tions on the growth and characterization of GaN-based HMAs. 4–7 In contrast, to the best of our knowledge no exper- imental data are available so far for ...

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Formation of Ga droplets on patterned GaAs (100) by molecular beam epitaxy

Formation of Ga droplets on patterned GaAs (100) by molecular beam epitaxy

... using molecular beam epitaxy ...droplet epitaxy (D-E) proposed by Koguchi et ...of material system for QNSs by D-E approach is highly elastic and thus, a variety of unseen ...

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Growth of GaN nanowall network on Si (111) substrate by molecular beam epitaxy

Growth of GaN nanowall network on Si (111) substrate by molecular beam epitaxy

... electron beam evaporation in the four corners of the 8 × 8 mm Si-doped GaN nanowall network sample grown with a N/Ga ratio of 400 to investigate its electronic ...conventional material to be fabricated to ...

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An atomic carbon source for high temperature molecular beam epitaxy of graphene

An atomic carbon source for high temperature molecular beam epitaxy of graphene

... party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the ...If material is not included in the article’s Creative Commons ...

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Structural and optical characterizations of InPBi thin films grown by molecular beam epitaxy

Structural and optical characterizations of InPBi thin films grown by molecular beam epitaxy

... Group III-V semiconductors containing small amounts of bismuth (Bi), popularly known as ‘dilute bismide, ’ attracted great attention in the past decade. Bismuth is the largest and the heaviest group V element with its ...

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High temperature molecular beam epitaxy of hexagonal boron nitride layers

High temperature molecular beam epitaxy of hexagonal boron nitride layers

... The growth and properties of hexagonal boron nitride (hBN) have recently attracted much attention. There are two main reasons for this high level of activity. First, the lattice parameter of hBN is very close to that of ...

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Incorporation of elemental boron during silicon and silicon germanium molecular beam epitaxy

Incorporation of elemental boron during silicon and silicon germanium molecular beam epitaxy

... However, the formation o f a surface adlayer is not in itself the mechanism responsible for precipitation during epitaxial growth. There must also be some diffusivity of dopant reflected by the observed clustering o f ...

176

Molecular beam epitaxy and properties of GaAsBi/GaAs quantum wells grown by molecular beam epitaxy: effect of thermal annealing

Molecular beam epitaxy and properties of GaAsBi/GaAs quantum wells grown by molecular beam epitaxy: effect of thermal annealing

... GaAsBi quantum well structures were grown using a 32P RIBER (Bezons, France) MBE system. Substrates were pieces of a semi-insulating GaAs substrate soldered with indium on a silicon wafer mounted on the substrate holder ...

5

InN nanorods prepared with CrN nanoislands by plasma assisted molecular beam epitaxy

InN nanorods prepared with CrN nanoislands by plasma assisted molecular beam epitaxy

... useful material for the fabrication of high-electron- mobility transistors, high frequency devices, and full- spectrum solar cells ...hetero epitaxy of InN films on sapphire or Si often results in a high ...

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Characterization and density control of GaN nanodots on Si (111) by droplet epitaxy using plasma assisted molecular beam epitaxy

Characterization and density control of GaN nanodots on Si (111) by droplet epitaxy using plasma assisted molecular beam epitaxy

... droplet epitaxy: Ga droplet formation, its growth mechanism has been experimentally and theoretically investigated in terms of nucleation, coalescence and ripening ...droplet epitaxy: GaN crystallization, ...

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Composition and luminescence of AlInGaN layers grown by plasma-assisted molecular beam epitaxy

Composition and luminescence of AlInGaN layers grown by plasma-assisted molecular beam epitaxy

... Plasma-assisted molecular beam epitaxy 共PA-MBE兲 of- fers several advantages over other epitaxial growth tech- niques including in situ control of the growth by high energy electron diffraction ...

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Graphitic platform for self catalysed InAs nanowires growth by molecular beam epitaxy

Graphitic platform for self catalysed InAs nanowires growth by molecular beam epitaxy

... High-resolution TEM (HRTEM) has provided direct ex- perimental evidence of the crystallinity of the InAs nano- wires grown on HOPG substrates. The InAs nanowires, with an average diameter of approximately 100 nm, were ...

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Bismuth Quantum Dots in Annealed GaAsBi/AlAs Quantum Wells

Bismuth Quantum Dots in Annealed GaAsBi/AlAs Quantum Wells

... The atomic force microscopy surface analysis demon- strated droplet-free surfaces of both as-grown and annealed MQW structures. The surface roughness of the GaAs cap layer was below 1 nm. The structural high- resolution ...

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Graphitic platform for self catalysed InAs nanowires growth by molecular beam epitaxy

Graphitic platform for self catalysed InAs nanowires growth by molecular beam epitaxy

... High-resolution TEM (HRTEM) has provided direct ex- perimental evidence of the crystallinity of the InAs nano- wires grown on HOPG substrates. The InAs nanowires, with an average diameter of approximately 100 nm, were ...

7

Study of InN epitaxial films and nanorods grown on GaN template by RF MOMBE

Study of InN epitaxial films and nanorods grown on GaN template by RF MOMBE

... through molecular beam epitaxy (MBE) [6], radio-frequency metalorganic molecular beam epitaxy (RF-MOMBE) [7], sputtering, and metalorganic chemical vapor depos- ition (MOCVD) ...

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