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nanoimprint lithography

Nanoimprint lithography for nanodevice fabrication

Nanoimprint lithography for nanodevice fabrication

... soft nanoimprint lithography for high yield, high throughput and low cost fabrica- ...optical lithography, so most nanoimprint lithography work has been on improving the performance of ...

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Nanoimprint lithography for planar chiral photonic meta materials

Nanoimprint lithography for planar chiral photonic meta materials

... Room temperature nanoimprint lithography has successfully been applied to the fabrication of planar chiral pho- tonic meta-materials. For dielectric chiral structures a single layer of thick HSQ was used ...

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Large scale fabrication of nanopatterned sapphire substrates by annealing of patterned Al thin films by soft UV nanoimprint lithography

Large scale fabrication of nanopatterned sapphire substrates by annealing of patterned Al thin films by soft UV nanoimprint lithography

... Large-scale nanopatterned sapphire substrates were fabricated by annealing of patterned Al thin films. Patterned Al thin films were obtained by soft UV-nanoimprint lithography and reactive ion etching. The ...

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Au nanostructure arrays for plasmonic applications: annealed island films versus nanoimprint lithography

Au nanostructure arrays for plasmonic applications: annealed island films versus nanoimprint lithography

... In this present work, two different approaches for nano- structure fabrication were used - a method based on gold island film deposition with subsequent thermal annealing and nanoimprint lithography (NIL) ...

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Soft UV nanoimprint lithography designed highly sensitive substrates for SERS detection

Soft UV nanoimprint lithography designed highly sensitive substrates for SERS detection

... We report on the use of soft UV nanoimprint lithography (UV-NIL) for the development of reproducible, millimeter-sized, and sensitive substrates for SERS detection. The used geometry for plasmonic ...

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Impact of Imprint Pressure on Residual Layer Thickness in UV Nanoimprint Lithography

Impact of Imprint Pressure on Residual Layer Thickness in UV Nanoimprint Lithography

... [6] P. Voisin, A. Jouve, M. Zelsmann, C. Gourgon, J. Boussey, Template flatness issue for UV curing nanoimprint lithography, SPIE Emerging Lithographic Technologies, 6517 (2007) 1-9. [7] K. Kim, J. Jeong, ...

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A modified squeeze equation for predicting the filling ratio of nanoimprint lithography

A modified squeeze equation for predicting the filling ratio of nanoimprint lithography

... Nanoimprint lithography (NIL), which was proposed by Chou [1], is widely considered to achieve complicated structures [2, 3] for electronic devices. This method, however, has several technical issues to ...

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Solvent immersion nanoimprint lithography of fluorescent conjugated polymers

Solvent immersion nanoimprint lithography of fluorescent conjugated polymers

... ard lithography techniques for producing DFB gratings such as ultraviolet nanoimprint lithography (UV-NIL) 10,11 and holographic polymerisation 12 need to be implemented in spe- cialised resist ...

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Nanoimprint lithography - the past, the present and the future

Nanoimprint lithography - the past, the present and the future

... (SPM) lithography [7, 8] were proposed to fabricate ...SPM lithography still suffers from low throughput and is therefore only applicable in a laboratory ...optical lithography approaches such as, ...

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A review of roll to roll nanoimprint lithography

A review of roll to roll nanoimprint lithography

... 1995, nanoimprint lithography has been demonstrated in many researches as a simple, low-cost, and high-throughput process for replicating micro- and nanoscale ...the nanoimprint lithography ...

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Large Area CoNi Stress Free Electroformed Mold for Nanoimprint Lithography

Large Area CoNi Stress Free Electroformed Mold for Nanoimprint Lithography

...  Anti-adhesion layer makes Si mother mold easy to separate and reproduce CoNi stamp. EE lectronic lectronic M M aterials and aterials and PP rocessing rocessing LL ab[r] ...

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Selective patterning of ZnO nanorods on silicon substrates using nanoimprint lithography

Selective patterning of ZnO nanorods on silicon substrates using nanoimprint lithography

... The nanoimprint processes were performed using an IMPRIO 100 (Molecular Imprint Inc., MII). Poly (methyl-methacrylate) (PMMA) (950K, A2) used as a planarization layer was spin-coated with a thickness of 65 nm on ...

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Development of Blue Laser Direct-Write Lithography System

Development of Blue Laser Direct-Write Lithography System

... the lithography during process. Generally speaking, lithography covers optical lithography[1] such as ultra violet (UV), deep ultra violet (Deep UV), electron beam (E-Beam) lithography[2-3], ...

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Fabrication of flexible UV nanoimprint mold with fluorinated polymer coated PET film

Fabrication of flexible UV nanoimprint mold with fluorinated polymer coated PET film

... In this study, a fluorinated polymer layer was coated on a flexible polyethylene terephthalate (PET) film, since micro- to nano-sized patterns can easily be formed on a fluorinated polymer layer by the hot embossing ...

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A fast thermal curing nanoimprint resist based on cationic polymerizable epoxysiloxane

A fast thermal curing nanoimprint resist based on cationic polymerizable epoxysiloxane

... for nanoimprint lithography (NIL) in addition to the imprint mold, the imprint machine, and imprint processes ...process, nanoimprint resists can be classified into two basic categories: ...

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Characterization of polymer nanowires fabricated using the nanoimprint method

Characterization of polymer nanowires fabricated using the nanoimprint method

... beam lithography, electro-chemical deposition, anodic aluminum oxide, nanosphere lithography, and nanoimprint lithography ...the nanoimprint lithography method to fabricate the ...

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Fabrication of diffractive elements using matrix laser lithography

Fabrication of diffractive elements using matrix laser lithography

... the recording process. Moreover, the resolution of the laser lithography can be push beyond the Rayleigh limit. Re- cently, the techniques based on a two-photon absorption or a stimulated emission depletion ...

5

Evanescent wave assist features for optical projection lithography

Evanescent wave assist features for optical projection lithography

... and found to be ideally 3%. Figure III.46 shows the best-focus cutlines for both binary and 3% APSM. In this case, the use of APSM improves the contrast by 24.9% and the NILS by 21% over the binary case. While performing ...

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Synthesis of low k1 projection lithography utilizing interferometry

Synthesis of low k1 projection lithography utilizing interferometry

... projection lithography systems examined throughout this work utilize partially coherent illumination primarily to obtain better modulation than incoherent illumination while still exceeding the coherent resolution ...

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Processes of Direct Laser Writing 3D Nano-Lithography

Processes of Direct Laser Writing 3D Nano-Lithography

... laser pulses can be focused into the volume of the resin. This makes 3DLL process conceptually different from the linear absorption (single photon) lithography, which is a planar process restricted to the surface ...

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