DC magnetron reactive sputtering
Aluminum nitride deposition using an AlN/Al sputter cycle technique
... a DC magnetron reactive sputtering ...the reactive gas is removed from the chamber and replaced with an inert gas, and a layer of metal is deposited on the chamber ...
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Effects of Titanium Sputtering Current on Structure and Morphology of TiZrN Films Prepared by Reactive DC Magnetron Co Sputtering
... Zr sputtering current was fixed at 0.6 A and Ti sputtering current varied from ...Ti sputtering current on the structure and morphology of the films were investigated by X-ray diffraction (XRD), ...
6
Pulsed DC reactive magnetron sputtering of aluminum nitride thin films
... what observed for glass due to the limitations of the mean free path. It may be induced by geometrical effects associated with disordered nature of the structure. Lambropoulos et al [122,123] reported the thermal ...
251
SPUTTERING POWER DEPENDENCE PHYSICAL PROPERTIES OF NANOCRYSTALLINE DC MAGNETRON SPUTTERED SnO2 THIN FILMS
... [11], reactive thermal evaporation [12], sputtering [13-15], plasma enhanced atomic layer deposition [16], and pulsed laser evaporation ...techniques DC reactive magnetron ...
9
Effects of Vanadium Content on Structure and Chemical State of TiVN Films Prepared by Reactive DC Magnetron Co Sputtering
... V sputtering current on the structure, surface and cross-sectional morphologies, and chemical composition and chemical state of the films were investigated by X-ray diffraction (XRD), atomic force microscopy (AFM) ...
8
Apatite Formation on Rutile TiO<sub>2</sub> Film Deposited Using Dual Cathode DC Unbalanced Magnetron Sputtering
... reactive gases respectively. The flow rates were separately controlled by mass flow controllers (MKS type 247D) with constant flow rates of 1.0 and 4.0 sccm. Before deposition, the chamber was evacuated to a base ...
8
Physical properties of nitrogen doped titanium dioxide thin films prepared by dc magnetron sputtering
... clearly that surface morphology of films waschanges by varying the nitrogen partial pressures. The films deposited at nitrogen partial pressure of 3x10 -3 mbar shows the combination of small grains andislands with rough ...
6
Annealing Effect on the Physical Properties of dc Reactive Magnetron Sputtered Nickel Oxide Thin Films
... Nickel Oxide (NiO) is usually taken as a model for p-type semiconductors and is an attractive material well known for its chemical stability, as well as for its excellent optical and electrical properties. It is a ...
6
Deposition of Al/Cu Multilayer By Double Targets Cylindrical DC Magnetron Sputtering System
... deposition magnetron type ...cylindrical magnetron sputtering target assembly includes a head and a main body connecting to the ...a reactive sputtering process with a reduced or ...
9
Plasma diagnosis of reactive high power impulse magnetron sputtering (HiPIMS) discharges
... There are many different technological plasma discharge configurations which make use of different geometries and heating mechanisms to ignite and sustain the plasma. In the simplest case, consider a pair of ...
220
Structure and tribological properties of TiN coatings grown by hybrid JIPIMS and CFUBMS deposition
... impulse magnetron sputtering (HIPIMS) has attracted substantial attention because of its ultra-dense plasma deposition ...powered magnetron in a closed field unbalanced magnetron ...
8
Influence of deposition parameters on the optical properties of thin tungsten oxide films prepared by reactive Dc magnetron sputtering
... Therefore, this study investigated the influence of sputtering power as well as deposition pressure on optical properties of tungsten oxide thin films.. MATERIALS AND METHODS.[r] ...
19
Heteroepitaxial growth of TiN film on MgO (100) by reactive magnetron sputtering
... processes, dc reactive sputtering is commonly used for deposition of polycrystalline and single-crystalline ...vacuum dc reactive magnetron sputtering of pure Ti ...
5
Time dependence of morphological and optical properties of DC sputtering grown copper oxide thin film
... The great researchers Uthman Isah K. and friend were synthesized the copper oxide thin film by using thermal evaporation method to study the effect of oxidation temperature on copper oxide thin film and published their ...
26
The effect of sputtering RF power on structural, optical and electrical properties of CuO and CuO2 thin films
... the DC reactive magnetron sputtering method is very good technique for prepared thin films, because this method is very controllable and usable in deposition on the large area ...temperature, ...
8
Deposition of c-axis orientation aluminum nitride films on flexible polymer substrates by reactive direct-current magnetron sputtering
... In this study, we investigated the synthesis and characteristics of AlN thin films on Dupont Kapton® polyimide film 100H polymer substrates with reactive DC magnetron sputtering. XRD and SEM ...
19
Highly (200)-Preferred Orientation TiN Thin Films Grown by DC Reactive Magnetron Sputtering
... XRD patterns of DC reactive sputtered TiN films prepared under various chamber pressure is shown in Figure 1. The TiN(111), TiN(200) and TiN(220) peaks at 2θ=36.9°, 42.9°, 62.1° are observed, the intensity ...
5
Effect of the degree of high power impulse magnetron sputtering utilisation on the structure and properties of TiN films
... conventional dc-UBM mode to deposit pure UBM coating, 1HIPIMS+3UBM and 2HIPIMS+2UBM cathodes to deposit combined HIPIMS/UBM coatings and 2HIPIMS cathodes to deposit pure HIPIMS ...UBM sputtering the targets ...
26
Hybrid HIPIMS and DC magnetron sputtering deposition of TiN coatings: Deposition rate, structure and tribological properties
... impulse magnetron sputtering (HIPIMS) has the advantage of ultra-dense plasma deposition environment although the resultant deposition rate is significantly ...unbalanced magnetron sputtering ...
12
Single step deposition method for nearly stoichiometric CuInSe2 thin films
... D.C. magnetron sputtering as a single step process that can produce the desired p-type CIS films with nearly stoichometric compositions without an associated selenization ...
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