• No results found

metal molecular beam epitaxy

Synthesis of long group IV semiconductor nanowires by molecular beam epitaxy

Synthesis of long group IV semiconductor nanowires by molecular beam epitaxy

... a metal seed particle, their length is mostly related to the way the chemical compounds are ...in molecular beam epitaxy (MBE), ultra high vacuum (UHV) conditions are ...

7

Growth variations and scattering mechanisms in metamorphic In0.75Ga0.25As/In-0.75 Al0.25As quantum wells grown by molecular beam epitaxy

Growth variations and scattering mechanisms in metamorphic In0.75Ga0.25As/In-0.75 Al0.25As quantum wells grown by molecular beam epitaxy

... the mobility is dominated by percolation which can only be fitted using metal- insulator transition theory[23]. At the high density end where second-subband populates (see Fig. 4), the mobility is limited by ...

19

The effect of metal-rich growth conditions on the microstructure of ScxGa1-xN films grown using molecular beam epitaxy

The effect of metal-rich growth conditions on the microstructure of ScxGa1-xN films grown using molecular beam epitaxy

... source under metal-rich growth conditions. A layer of molybdenum (Mo) was deposited on the back of the sapphire substrate by sputtering to assist substrate temperature measurement using an optical pyrometer. The ...

11

Magnetotransport in an aluminum thin film on a GaAs substrate grown by molecular beam epitaxy

Magnetotransport in an aluminum thin film on a GaAs substrate grown by molecular beam epitaxy

... As shown in Figure 4a, for 4.8 K ≦ T ≦ 78 K, the metallic behavior can be observed without a transition to the insulator, as is the case for a pure metal [11]. The mean free path for the bulk Al is approximately ...

6

Self assembled growth of MnSi~1 7 nanowires with a single orientation and a large aspect ratio on Si(110) surfaces

Self assembled growth of MnSi~1 7 nanowires with a single orientation and a large aspect ratio on Si(110) surfaces

... vacuum molecular beam epitaxy-STM system (Multiprobe XP, Omicron, Taunusstein, Germany) with a base pressure of less than ...1 metal atom per 1 × 1 ...

8

Characterization and density control of GaN nanodots on Si (111) by droplet epitaxy using plasma assisted molecular beam epitaxy

Characterization and density control of GaN nanodots on Si (111) by droplet epitaxy using plasma assisted molecular beam epitaxy

... instance, molecular beam epitaxy (MBE) and metal organic chemical vapor deposition (MOCVD) provided nanodots growth via Stranski-Krastanov (SK) mode, which requires sufficient lattice mismatch ...

6

InN nanorods prepared with CrN nanoislands by plasma assisted molecular beam epitaxy

InN nanorods prepared with CrN nanoislands by plasma assisted molecular beam epitaxy

... Samples used in this study were all prepared on Si (111) substrate by PA-MBE. The In source was 7N5 pure metal, loaded in a conventional effusion cell. On the other hand, the N source was 6N pure nitrogen gas ...

6

Growth of Inclined GaAs Nanowires by Molecular Beam Epitaxy: Theory and Experiment

Growth of Inclined GaAs Nanowires by Molecular Beam Epitaxy: Theory and Experiment

... by metal organic chemical vapor deposition (MOCVD) [1, 2] or MBE [3–7] via the so-called vapor– liquid–solid (VLS) mechanism [11] on the substrates activated by a metal (Au) growth ...

6

Molecular beam epitaxy of GaN1–xBix alloys with high bismuth content

Molecular beam epitaxy of GaN1–xBix alloys with high bismuth content

... observe metal droplets at the edge of the ...the metal droplets cover the whole wafer area and the density of the droplets increases from the centre to the ...

5

Compositional variations in In0 5Ga0 5N nanorods grown by molecular beam epitaxy

Compositional variations in In0 5Ga0 5N nanorods grown by molecular beam epitaxy

... geometrical model, which explains the MBE growth of GaN nanorods, assumes no diffusion, or desorption, giving an aspect ratio which depends on the angle of inclination of the metal sources[16]. The results here ...

7

Formation of Ga droplets on patterned GaAs (100) by molecular beam epitaxy

Formation of Ga droplets on patterned GaAs (100) by molecular beam epitaxy

... The fabrication of epitaxial QNSs is inherently dependent on the size, shape, and density of initial liquid phase metal droplets (MDs) and consequently, the con- trol of the density and size of MDs becomes an ...

9

Temperature dependence of band gap in MoSe2 grown by molecular beam epitaxy

Temperature dependence of band gap in MoSe2 grown by molecular beam epitaxy

... Growth of TMD film has been rapidly developing to meet the elevated interests for various ways, such as chemical vapor deposition (CVD), pulsed laser depos- ition, and molecular beam epitaxy (MBE) ...

7

Molecular beam epitaxy in the lithium-niobium-oxygen system

Molecular beam epitaxy in the lithium-niobium-oxygen system

... by molecular oxygen is not extensive near room temperature'413,4141: the sticking coefficient of 0 2 on clean N b (llO ), though initially quite high ...that molecular oxygen had no observable effect on the ...

192

Graphitic platform for self catalysed InAs nanowires growth by molecular beam epitaxy

Graphitic platform for self catalysed InAs nanowires growth by molecular beam epitaxy

... by metal- organic chemical vapour deposition (MOCVD), GaAs [6] NWs grown by molecular beam epitaxy (MBE), ZnO NWs [7,8], as well as thin films such as GaN on graphite substrates via an ...

8

Multilayer bioactive glass/zirconium titanate thin films in bone tissue engineering and regenerative dentistry

Multilayer bioactive glass/zirconium titanate thin films in bone tissue engineering and regenerative dentistry

... technique, molecular beam epitaxy, pulse laser depo- sition, spin coating, DC reactive magnetron sputtering, elec- trophoretic deposition, electrolytic deposition, metal organic chemical vapor ...

8

Silicon molecular beam epitaxy : doping and material aspects

Silicon molecular beam epitaxy : doping and material aspects

... (i) Intrinsic gettering involves the formation o f micro-crystals o f S i0 2 which provide strain sites at which other impurity atoms can precipitate. (Craven 1985). The standard process involves 3 (high- low-high) tem ...

185

Growth of InAs Quantum Dots on Germanium Substrate Using Metal Organic Chemical Vapor Deposition Technique

Growth of InAs Quantum Dots on Germanium Substrate Using Metal Organic Chemical Vapor Deposition Technique

... both molecular beam epitaxy (MBE) and metal organic chemical vapor deposition (MOCVD) techniques have been reported by several groups [12, 13], and effects of growth rate, V/III ratio, growth ...

7

Effect of In/Al ratios on structural and optical properties of InAlN films grown on Si(100) by RF MOMBE

Effect of In/Al ratios on structural and optical properties of InAlN films grown on Si(100) by RF MOMBE

... On the other hand, silicon is a very promising material for growth of III-nitride materials, with its good thermal conductivity which is especially interesting for electro- nic applications [17] and also for low-cost ...

7

Increased p type conductivity in GaNxSb1−x, experimental and theoretical aspects

Increased p type conductivity in GaNxSb1−x, experimental and theoretical aspects

... epitaxy, and the results have been compared with calculated first-principle results corresponding to different defect structures. From the calculated data, binding energies for nitrogen-related defects have also ...

10

Electrostatic tuning of LaAlO3 SrTiO3 interface devices

Electrostatic tuning of LaAlO3 SrTiO3 interface devices

... In material, the laws are not set by a government, but they are the laws of physics. Electronic classification is done by the band structure of the material. A band structure is the electronic map of the material in ...

97

Show all 10000 documents...

Related subjects