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Nanosphere Lithography

Development of Nanosphere Lithography for Semiconductor Device Applications

Development of Nanosphere Lithography for Semiconductor Device Applications

... As society looks for more efficient lighting and energy solutions for the future, devices such as LEDs and solar cells emerge as frontrunners as they are not bounded by traditional inefficiencies and their performance ...

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Localized Surface Plasmon Resonance Biosensing with Large Area of Gold Nanoholes Fabricated by Nanosphere Lithography

Localized Surface Plasmon Resonance Biosensing with Large Area of Gold Nanoholes Fabricated by Nanosphere Lithography

... Abstract Localized surface plasmon resonance (LSPR) has been extensively studied as potential chemical and biological sensing platform due to its high sensitivity to local refractive index change induced by molecule ...

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Enhancing Raman and Fluorescence Spectroscopies with Nanosphere Lithography Platforms

Enhancing Raman and Fluorescence Spectroscopies with Nanosphere Lithography Platforms

... Recently, different structures such as nano-rings, 13 nano-nets, 78 nano-pillars, 79 nano- pores, 80 and nano-holes 75, 81 can be made by reactive ion etching (RIE) of the polystyrene mask prior to metal deposition. ...

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Formation mechanism of SiGe nanorod arrays by combining nanosphere lithography and Au assisted chemical etching

Formation mechanism of SiGe nanorod arrays by combining nanosphere lithography and Au assisted chemical etching

... The formation mechanism of SiGe nanorod (NR) arrays fabricated by combining nanosphere lithography and Au- assisted chemical etching has been investigated. By precisely controlling the etching rate and ...

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Uniform SiGe/Si quantum well nanorod and nanodot arrays fabricated using nanosphere lithography

Uniform SiGe/Si quantum well nanorod and nanodot arrays fabricated using nanosphere lithography

... interference lithography [6], nanoimprint lithography [7], ion beam lithography [8], and electron beam lithography ...areas. Nanosphere lithography (NSL) has emerged as an ...

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Fabrication of Nickel Nanostructure Arrays Via a Modified Nanosphere Lithography

Fabrication of Nickel Nanostructure Arrays Via a Modified Nanosphere Lithography

... beam lithography, focused ion beam (FIB), and X-ray lithography have been widely used in nanofabrication due to their high resolu- ...nanoimprinting lithography (NIL) and nanosphere ...

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An investigation of physical processes in nanosphere lithography

An investigation of physical processes in nanosphere lithography

... Chapter 1: Introduction Scientists have considered shorter wavelength radiation sources, such as X-Ray and electron beam, to be used to modify the chemical properties of the polymer resi[r] ...

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High resolution magnetic force microscopy of patterned L1(0)-FePt dot arrays by nanosphere lithography

High resolution magnetic force microscopy of patterned L1(0)-FePt dot arrays by nanosphere lithography

... bilayer nanosphere templates as masks for FePt multilayer deposition at room temperature, which is followed by the removal of nanosphere templates and a post- annealing process ...

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Fabrication of periodic nanoparticle arrays using nanosphere lithography technique and thin film gold as electrically enhanced catalysts

Fabrication of periodic nanoparticle arrays using nanosphere lithography technique and thin film gold as electrically enhanced catalysts

... beam lithography (EBL) technique (Tseng et al, 2003) has several advantages where the scale patterning is possible towards ~ 20 nm compared to the resolution of ~ 100 nm for conventional ...

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On Demand Fabrication of Si/SiO2 Nanowire Arrays by Nanosphere Lithography and Subsequent Thermal Oxidation

On Demand Fabrication of Si/SiO2 Nanowire Arrays by Nanosphere Lithography and Subsequent Thermal Oxidation

... growth is the most commonly used bottom-up method to produce Si NWs arrays, but the high temperature required for synthesis, the incorporation of metal impurities, the dif- ficulties in controlling NWs diameter, lack of ...

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Development of Blue Laser Direct-Write Lithography System

Development of Blue Laser Direct-Write Lithography System

... GSSO thickness of 80 nm, nano-pattern obtained from thermal lithography can reach up to 140 nm. In the same year, Y. Usami et al. [14] developed one inorganic resist available for thermal lithography with ...

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Evanescent wave assist features for optical projection lithography

Evanescent wave assist features for optical projection lithography

... Figure IV.1: Schematic of the process flow used to fabricate EWAF devices. Reference devices are identical with steps (iii), (iv), and (v) omitted. .............................................127 Figure IV.2: Schematic ...

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Synthesis of low k1 projection lithography utilizing interferometry

Synthesis of low k1 projection lithography utilizing interferometry

... projection lithography systems examined throughout this work utilize partially coherent illumination primarily to obtain better modulation than incoherent illumination while still exceeding the coherent resolution ...

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Processes of Direct Laser Writing 3D Nano-Lithography

Processes of Direct Laser Writing 3D Nano-Lithography

... laser lithography fabrication process in the means of application of diverse post-processing methods and research into novel photo-curable materials including inorganic ...

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Nanofabrication Process by Reactive Ion Etching of Polystyrene Nanosphere on Silicon Surface

Nanofabrication Process by Reactive Ion Etching of Polystyrene Nanosphere on Silicon Surface

... Many studies have been reported for fabrication of nanostructure using PS spheres for examples He et al [19] fabricated vertical nanostructure arrays (VNAs) by plasma etching processes and their applications in biology, ...

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Solvent immersion nanoimprint lithography of fluorescent conjugated polymers

Solvent immersion nanoimprint lithography of fluorescent conjugated polymers

... Recently, a new imprinting technique was reported by Vasdekis et al., solvent immersion imprint lithography (SIIL), 16 which was used to create microfluidic channels. This is a solvent based method in which ...

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Nanoimprint lithography for planar chiral photonic meta materials

Nanoimprint lithography for planar chiral photonic meta materials

... Throughout the work, the gammadion shape (a cross-plus four bending arms) as shown in Figs. 2, 4 and 5, was selected. This is mainly due to two reasons. One is that such kind of gam- madion shape is the simplest planar ...

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Fabrication of diffractive elements using matrix laser lithography

Fabrication of diffractive elements using matrix laser lithography

... laser lithography approach was presented which uses the projection of the desired element or its parts from the computer driven spatial light modulator on the record- ing ...

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Effects of Structural Parameters on Liquid Flowing in Immersion Lithography

Effects of Structural Parameters on Liquid Flowing in Immersion Lithography

... immersion lithography, the flowing of the immersion liquid needs not only a fast speed to quicken the circulation of the immersion liquid, but a stable speed to ensure the high quality of the exposed images on the ...

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Micro  or nanorod and nanosphere structures derived from a series of phenyl porphyrins

Micro or nanorod and nanosphere structures derived from a series of phenyl porphyrins

... micro- and nanorods and nanospheres occurring in significant numbers. The images show that the micro/nanorods and nano- spheres occur randomly over the substrate. The orientations of the micro/nanorods are random. ...

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