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RF sputtering

Nano Morphological, Magnetic and Structural Properties of Ni Films Prepared by RF Sputtering

Nano Morphological, Magnetic and Structural Properties of Ni Films Prepared by RF Sputtering

... with sputtering time in perpendicular ...suitable sputtering time in our preparation of Ni films with a highest saturation magnetization is 90 min practically by ...

8

Structural and Optical Properties of Zinc Oxide Film Prepared Using RF-Sputtering Technique for Glugose Biosensor

Structural and Optical Properties of Zinc Oxide Film Prepared Using RF-Sputtering Technique for Glugose Biosensor

... Firstl, the Si substrate was cleaned thoroughly using the RCA method. A thin film of ZnO was deposited on Si substrate using RF sputtering technique and its thickness was measured by using optical ...

8

Effects of NIR annealing on the characteristics of al doped ZnO thin films prepared by RF sputtering

Effects of NIR annealing on the characteristics of al doped ZnO thin films prepared by RF sputtering

... been lots of reports concerning substrate temperature, oxygen pressure, target to substrate distance, and post- deposition annealing on the AZO thin-film quality using RF sputtering methods [15-18]. Because ...

7

Dependencies of microstructure and stress on the thickness of GdBa2Cu3O7 − δ thin films fabricated by RF sputtering

Dependencies of microstructure and stress on the thickness of GdBa2Cu3O7 − δ thin films fabricated by RF sputtering

... magnetron sputtering (RF sputtering) in order to understand the problems mentioned above, particularly with respect to microstructure and residual ...

9

Mechanical Properties of Composite SiNx/DLC Films Prepared by Filtered Cathodic Arc of Graphite Incorporated with RF Sputtering of Silicon Nitride

Mechanical Properties of Composite SiNx/DLC Films Prepared by Filtered Cathodic Arc of Graphite Incorporated with RF Sputtering of Silicon Nitride

... Mechanical Properties of Composite SiNx/DLC Films Prepared by Filtered Cathodic Arc of Graphite Incorporated with RF Sputtering of Silicon Nitride Phuwanai Bunnak1,2*, Yongping Gong2, Su[r] ...

8

Effects of Laser Radiation on the Optical and Electrical Properties of ITO Thin Films Deposited by RF Sputtering

Effects of Laser Radiation on the Optical and Electrical Properties of ITO Thin Films Deposited by RF Sputtering

... Deposition technique plays a key role in obtaining an improved optical and electrical properties of ITO thin films. Various methods of thin films deposition have been used: chemical vapour deposition method [12]; spray ...

6

InSb added TiO2 nanocomposite films by RF sputtering

InSb added TiO2 nanocomposite films by RF sputtering

... favorable for low-cost production of solar cells. Package synthesis requires a specific material design for each de- position technique, for example, radio frequency (RF) sputtering [10,11] and hot-wall ...

6

Low temperature fabrication of layered self organized Ge clusters by RF sputtering

Low temperature fabrication of layered self organized Ge clusters by RF sputtering

... In this study, we have shown formation of self-organized Ge nanoclusters at low temperature (250°C) in amor- phous silica matrix by the magnetron sputtering techni- que. The size distribution of the clusters ...

7

Investigating optical properties of ITO thin film grown by RF sputtering

Investigating optical properties of ITO thin film grown by RF sputtering

... Indium tin oxide thin films have successfully been deposited on corning glass by using radio frequency magnetron sputtering technique. The optical properties of the deposited films are measured and characterized ...

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Porous NASICON Type Li3Fe2(PO4)3 Thin Film Deposited by RF Sputtering as Cathode Material for Li Ion Microbatteries

Porous NASICON Type Li3Fe2(PO4)3 Thin Film Deposited by RF Sputtering as Cathode Material for Li Ion Microbatteries

... frequency sputtering with an annealing treatment. The thin films were characterized by XRD, SEM, and electrochemical techniques. The chronoamperometry experiments showed that a discharge capacity of 88 mAhg − 1 ...

5

Growth and crystallographic feature dependent characterization of spinel zinc ferrite thin films by RF sputtering

Growth and crystallographic feature dependent characterization of spinel zinc ferrite thin films by RF sputtering

... oriented films) were grown on various substrates by radio-frequency magnetron sputtering. The type of substrate used profoundly affected the surface topography of the resulting ZFO films. The surface of the ZFO ...

8

SiC formation for a solar cell passivation layer using an RF magnetron co sputtering system

SiC formation for a solar cell passivation layer using an RF magnetron co sputtering system

... to its wide bandgap, excellent coefficient of thermal expansion that matches with silicon wafers, relatively good thermal and mechanical stabilities, superior cost- of-ownership compared to other materials, and so on. ...

5

Fabrication of smart glass electrochromic device using RF magnetron sputtering

Fabrication of smart glass electrochromic device using RF magnetron sputtering

... used RF sputtering to produce dielectric films from dielectric ...However, RF sputter deposition is not used widely due to their high cost and the introduction of high temperatures, due to the high ...

43

Structural Properties of Hydroxyapatite (HA ) Thin Film on Ti-6Al-4V Alloy Prepared by Radio Frequency Plasma Sputtering

Structural Properties of Hydroxyapatite (HA ) Thin Film on Ti-6Al-4V Alloy Prepared by Radio Frequency Plasma Sputtering

... RF sputtering was used to prepare HAp layer on Ti6Al4V alloy by using high purity ...W RF power) for 15 ...a RF power 200 W for 1 h duration. During the sputtering process, the ...

5

Discussion on the Peak Shift of Α-Ti Phase in Tio

Discussion on the Peak Shift of Α-Ti Phase in Tio

... by RF sputtering at the same annealing ...by RF sputtering had an amount of rutile phase increasing fast after annealing from 500 to 600 ...the RF magnetron sputtering method had ...

11

Effect of Substrate Temperature on Structural and Optical Properties of Au/SiO2 Nanocomposite Films Prepared by RF Magnetron Sputtering

Effect of Substrate Temperature on Structural and Optical Properties of Au/SiO2 Nanocomposite Films Prepared by RF Magnetron Sputtering

... Silica films containing gold nanoparticles were grown by magnetron radio frequency (rf) sputtering technique under various deposition conditions. The structural and optical properties of the composite films ...

11

Fabrication of Tin Oxide Thin Film Transistors by RF Magnetron Sputtering Using Sn/SnO Composite Target

Fabrication of Tin Oxide Thin Film Transistors by RF Magnetron Sputtering Using Sn/SnO Composite Target

... by RF magnetron sputtering process, which has a high deposition rate, uniform thickness control, simple stoichiometry control, and ...in RF sputtering to utilize the benefits of both metallic ...

5

Anticorrosion Behavior of Deposited Magnetite on Galvanized Steel in Saline Water Using RF-Magnetron Sputtering

Nafeesa J. Kadhim1* Ahlam M. Farhan1 Harith I. Jaafer2

Anticorrosion Behavior of Deposited Magnetite on Galvanized Steel in Saline Water Using RF-Magnetron Sputtering Nafeesa J. Kadhim1* Ahlam M. Farhan1 Harith I. Jaafer2

... scanning electron microscopy (SEM) technique was a Hitachi S4160.More uniform grains may lead to more protection results, via the surface morphologies. Cross section have been analyzed via a Zeiss Supra 55VP ...

9

Growth and Characterization of Cu2znsns4 Thin Film by RF-Magnetron Sputtering

Growth and Characterization of Cu2znsns4 Thin Film by RF-Magnetron Sputtering

... beam sputtering [10], electron beam evaporation [11, 12], RF sputtering [13, 14], hybrid sputtering [15], pulsed laser deposition [16], photo- chemical deposition [17], sol–gel [18], spray ...

6

Effects of Deposition Parameters and Oxygen Addition on Properties of Sputtered Indium Tin Oxide Films

Effects of Deposition Parameters and Oxygen Addition on Properties of Sputtered Indium Tin Oxide Films

... and RF power produced films with larger grains and, therefore, fewer grain boundaries, which can hinder the electron movement and increase the films ...50W RF power deposition the resistivity decreased ...

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