High Power Density Pulsed Magnetron Sputtering
High-power Impulse Magnetron Sputtering
... Description of industry specific problem impact Analysis of industry specific financial market potential Potential companies Analyzed application fields build the foundation for an p[r] ...
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Linköping University Post Print. CrNx Films Prepared by DC Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering: A Comparative Study
... using high- power pulsed magnetron sputtering, also known as high-power impulse magnetron sputtering (HiPIMS), have been compared with those made by ...
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Advanced coatings through pulsed magnetron sputtering
... in high efficiency photovoltaic ...into high performance photovoltaic devices. Their high resistance to radiation damage 8 Optical transmission spectra for CIS coating ...
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Dynamic pressure measurements in high power impulse magnetron sputtering
... is high enough (in the order of 1- 100mTorr) to expose the substrate to a significant number of impinging ...a sputtering event, and the target atom can now be transported towards the substrate, eventually ...
Target poisoning during CrN deposition by mixed high power impulse magnetron sputtering and unbalanced magnetron sputtering technique
... increased resulting into flatter surfaces. The cross-section appeared glassy for lowest N 2 flow rate, figure 6a, and became faceted (figure 6b to e) as the flow rate increased. Similar dependency of microstructure on ...
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Target poisoning during CrN deposition by mixed high power impulse magnetron sputtering and unbalanced magnetron sputtering technique
... constant power mode) is a direct result of continuously reducing sputtering yield owing to the formation of a compound which has a higher secondary electron emission ...
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Target poisoning during CrN deposition by mixed high power impulse magnetron sputtering and unbalanced magnetron sputtering technique
... increased resulting into flatter surfaces. The cross-section appeared glassy for lowest N 2 flow rate, figure 6a, and became faceted (figure 6b to e) as the flow rate increased. Similar dependency of microstructure on ...
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Influence of power pulse parameters on the microstructure and properties of the AlCrN coatings by a modulated pulsed power magnetron sputtering
... MPP power source corresponded to higher scales of peak voltage, peak current and increased peak power, which resulted in higher plasma density and stronger ionization of deposition ...higher ...
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Pulsed DC magnetron sputtering of transparent conductive oxide layers
... meaning that the substrate carrier was moved below the three available target stations with a velocity of approximately 130 cm/min. The film thickness could be varied by the number of passes. The target to sub- strate ...
The use of segmented cathodes to determine the spoke current density distribution in high power impulse magnetron sputtering plasmas
... Using a segmented target the current densities associated with rotating spokes in a HiPIMS 20. discharge have been investigated[r] ...
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High rate deposition of thin film cadmium sulphide by pulsed direct current magnetron sputtering
... using pulsed DC magnetron sputtering is of particular ...deposition power at the magne- tron target (corresponding to a power density of ~ ...is high and much faster than ...
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High rate deposition of thin film CdTe solar cells by pulsed dc magnetron sputtering
... at high deposition rates and under stable process conditions using pulsed DC magnetron ...A high density of planar defects was observed in the as deposited ...defect density was ...
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Pulsed DC reactive magnetron sputtering of aluminum nitride thin films
... what observed for glass due to the limitations of the mean free path. It may be induced by geometrical effects associated with disordered nature of the structure. Lambropoulos et al [122,123] reported the thermal ...
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TaN thin films deposited by modulated pulsed power magnetron sputtering: Coating solutions for harsh environments
... P a g e 182 | 286 β alloys: Al- and V-free new Ti alloys. Different alloys can be found including mainly the following alloying elements: Mo, Nb, Ta and Zr. Currently, all these metallic biomaterials are commonly used ...
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High power impulse magnetron sputtering discharges: Instabilities and plasma self organization
... To study the discharge with high temporal- and spatial resolution, we observed the cathode surface face-on through a silica glass view port with wavelength cutoff at 300 nm. The window retained transparency over a ...
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Plasma diagnosis of reactive high power impulse magnetron sputtering (HiPIMS) discharges
... 2.3 Magnetron discharge In diode sputtering, the pressure required to maintain a sufficiently dense plasma is com- parably high when compared to a magnetron sputtering ...a ...
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Effect of Sputtering Power on the Nucleation and Growth of Cu Films Deposited by Magnetron Sputtering
... DC power helps to increase the surface mobility and this results in forming a large crystallite size which may be due to high adatom energy, and thereby highly crystalline Cu films can be ...DC power ...
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Defect growth in multilayer chromium nitride/niobium nitride coatings produced by combined high power impulse magnetron sputtering and unbalance magnetron sputtering technique
... defect density of the coating produced by HIPIMS/UBM technique in a clean chamber reduced ...defect density in UBM coating can be attributed to the low energetic particles in the plasma during UBM ...
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Defect growth in multilayer chromium nitride/niobium nitride coatings produced by combined high power impulse magnetron sputtering and unbalance magnetron sputtering technique
... defect density of the coating produced by HIPIMS/UBM technique in a clean chamber reduced ...defect density in UBM coating can be attributed to the low energetic particles in the plasma during UBM ...
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Thin film CDTE solar cells deposited by pulsed DC magnetron sputtering
... layer. High densities of planar defects were observed in the HR-TEM images of the as-deposited ...defect density was observed in the CdTe solar cell deposited at 200 ºC substrate ...
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