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oxide/nitride/oxide

Tunneling currents through ultrathin oxide/nitride dual layer gate dielectrics for advanced microelectronic devices

Tunneling currents through ultrathin oxide/nitride dual layer gate dielectrics for advanced microelectronic devices

... thicker oxide/nitride dual layer films, having the same capacitance-voltage ~ or equivalently oxide-equivalent thick- ness ! as the physically thinner single layer oxides, may re- duce the tunneling ...

11

Gallium nitride nanowire by nitridation of electrochemically grown gallium oxide on silicon

Gallium nitride nanowire by nitridation of electrochemically grown gallium oxide on silicon

... Gallium nitride (GaN) is a very hard, chemically and mechanically stable wide band gap ...gallium oxide (Ga2O3) has been studied as the seed material for chemical synthesize o f GaN by thermal ...

36

Zinc oxide-carbon nitride and zinc oxide-reduced graphene oxide composite for photodegradation of phenol and hydrogen production from water

Zinc oxide-carbon nitride and zinc oxide-reduced graphene oxide composite for photodegradation of phenol and hydrogen production from water

... carbon nitride-zinc oxide (CN-ZnO) and reduced graphene oxide-zinc oxide (rGO-ZnO) composites were prepared by impregnation and photoreduction methods, ...

52

Synthesis and characterisation of C3 N4  –  V2 O5 nanocomposite and its photocatalytic and  electrochemical properties

Synthesis and characterisation of C3 N4 – V2 O5 nanocomposite and its photocatalytic and electrochemical properties

... investigated by SEM. The SEM vanadium oxide are shown in Fig 9. was distributed from 1 to 3 µm. The layered shape morphology is clearly shown in Fig 9b. The layered was agglomerated sheet like morphology of carbon ...

8

Suppression of boron transport out of p(+) polycrystalline silicon at polycrystalline silicon dielectric interfaces

Suppression of boron transport out of p(+) polycrystalline silicon at polycrystalline silicon dielectric interfaces

... RPECVD nitride depositions in a range from ⬃ ...CVD oxide to prevent the boron out-diffusion during dopant activation ...equivalent oxide electrical thickness was determined by capacitance–voltage (C ...

10

Single, double and surround gate vertical MOSFETs with reduced parasitic capacitance

Single, double and surround gate vertical MOSFETs with reduced parasitic capacitance

... gate oxide, a 60 nm channel length, a 100 nm minimum feature size and a 50 nm alignment ...the nitride spacer thickness to 40 nm, the polysilicon gate thickness to 60 nm and the FILOX was 40 nm ...field ...

9

Characterization of CuxNy AND CdO:Al thin films for solar cell applications

Characterization of CuxNy AND CdO:Al thin films for solar cell applications

... The use of major sources of energy such as fossil fuel has increased carbon dioxide emissions that cause global warming. In addition, these sources are not environment friendly due to pollution. As a result, there is ...

79

Design and fabrication of structured roughnesses in microchannels with integrated MEMS pressure sensors

Design and fabrication of structured roughnesses in microchannels with integrated MEMS pressure sensors

... the nitride layer was etched, the oxy-nitride etch was performed in 10:1 BOE ...the oxide layer was not protected by photoresist or any other masking ...the oxide layer on the front side gets ...

88

Cordes, Niklas
  

(2019):


	Ammonothermal synthesis of functional nitride oxides and ternary nitrides.


Dissertation, LMU München: Fakultät für Chemie und Pharmazie

Cordes, Niklas (2019): Ammonothermal synthesis of functional nitride oxides and ternary nitrides. Dissertation, LMU München: Fakultät für Chemie und Pharmazie

... between 1.9 – 2.1 eV. Above that, f-f transition of lanthanide perovskites were observed with UV/VIS measurements for the first time. These two publications clearly show the feasibility of nitride oxide ...

169

Manuscript Title & Authors

Manuscript Title & Authors

... in oxide thickness. But on another way, if we move for putting nitride layer over this oxide then due to tensile stress, stress at oxide-nitride boundaries ...increasing oxide ...

7

Microstructure and Phase Composition of Cold Isostatically Pressed and Pressureless Sintered Silicon Nitride

Microstructure and Phase Composition of Cold Isostatically Pressed and Pressureless Sintered Silicon Nitride

... silicon nitride processing is the high cost of such commercial methods as hot isostatic pressing (HIP), spark plasma sintering (SPS), and gas pressure sintering ...

6

Electrical and Optical Properties of Ga-Doped Mg1-xZnxO System

Electrical and Optical Properties of Ga-Doped Mg1-xZnxO System

... tin oxide (ITO) is the most widely used TCO ...Zinc oxide doped with group III elements ...zinc oxide is quite abundant and can have varying bandgap through ...zinc oxide is in the range of 10 ...

203

Solution Based Functionalization of Nanostructured Oxides with Organic Molecules.

Solution Based Functionalization of Nanostructured Oxides with Organic Molecules.

... gallium nitride is attributed to their documented chemical inertness 49 and biocompatibility through aqueous stability 50 when compared to other III-V ...gallium nitride with phosphoric acid in the presence ...

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