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p/sup +/ etch-stop membrane technology anisotropic etching

EDNRB isoform 3 confers Temozolomide resistance in A375 melanoma cells by modulating membrane potential, reactive oxygen species and mitochondrial Ca2+

<p>EDNRB isoform 3 confers Temozolomide resistance in A375 melanoma cells by modulating membrane potential, reactive oxygen species and mitochondrial Ca<sup>2+</sup></p>

... ndings sup- port a relationship between an increase in mitochondrial Ca 2+ absorbing and resistance to cell death following expo- sure of TMZ in absence of EDNRB isoform 3 ...

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IN.PACTTM AdmiralTM drug-coated balloons in peripheral artery disease: current perspectives

<p>IN.PACT<sup>TM</sup> Admiral<sup>TM</sup> drug-coated balloons in peripheral artery disease: current perspectives</p>

... adjudicated CD-TLR conducted via telephone interview, which was defined as any reintervention of the target lesion due to symptoms or drop in ankle-brachial index (ABI) of ≥ 20% or > 0.15) when compared with ...

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An integrated safety analysis of combined acetaminophen and ibuprofen (Maxigesic&reg;/ Combogesic&reg;) in adults

<p>An integrated safety analysis of combined acetaminophen and ibuprofen (Maxigesic<sup>&reg;</sup>/ Combogesic<sup>&reg;</sup>) in adults</p>

... Analysis of the safety data pooled from multiple repeated- dose Phase II/III clinical studies illustrates the excellent tolerability and safety of multiple FDC APAP/IBP oral tablet dos[r] ...

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Gold etching for microfabrication

Gold etching for microfabrication

... dry etching methods ...etchant. Etching is typically used to fabricate micron- sized features, but by using high-resolution stepper or e-beam lithography, it can be extended to the submicron domain to ...

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Oxidation state of a polyurethane membrane after plasma etching

Oxidation state of a polyurethane membrane after plasma etching

... plasma etching and characterised by X-ray photoelectron spectroscopy. Etching resulted in increased cross-linking at the isocyanate bond and formation of new oxygen ...

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Comparison of shear & tensile bond strength of brackets bonded with a conventional (2 step) and a self- etch (All in One) bonding systems: An in vitro study

Comparison of shear & tensile bond strength of brackets bonded with a conventional (2 step) and a self- etch (All in One) bonding systems: An in vitro study

... Self- etching primer is similar to that of phosphoric acid, with two primer chains that form a solid primer matrix upon ...to etch the enamel as soon as it is applied, but changes to a primer once the two ...

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Nanofabrication for On-Chip Optical Levitation, Atom-Trapping, and Superconducting Quantum Circuits

Nanofabrication for On-Chip Optical Levitation, Atom-Trapping, and Superconducting Quantum Circuits

... plasma etching in which the small size of the holes physically restricts the hole from being etched at the same rate as the larger ...without etching different sized corrugations at different etch ...

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Portable etching machine

Portable etching machine

... Other than that, this machine will operates by using motor that can spin the PCB for etching process. It will supply by 12V input and the speed of motor can be control and can spin by forward and reverse. Then, ...

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Formation of Stacked SiGe Nano-bridges

Formation of Stacked SiGe Nano-bridges

... erostructure” implies that sections of different materials with the same diameter are grown along the same axis, while ”radial heterostructure” refers to concentric shells of different materials. If the vapor ...

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Realization of large-scale sub-10 nm nanogratings using a repetitive wet-chemical oxidation and etching technique

Realization of large-scale sub-10 nm nanogratings using a repetitive wet-chemical oxidation and etching technique

... In a successful effort to produce tens of nanometer- scale nanogratings over a large area, we previously devel- oped a pattern downscaling technology based on multiple spacer lithography and pattern-recovery ...

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Growth and dislocation studies of β-HMX

Growth and dislocation studies of β-HMX

... from etching (and as shown in a subsequent paper, describing microindentation studies) strongly suggests that the observed etch pits are asso- ciated with emergence of ...

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Unraveling the Morphological Evolution and Etching Kinetics of Porous Silicon Nanowires During Metal Assisted Chemical Etching

Unraveling the Morphological Evolution and Etching Kinetics of Porous Silicon Nanowires During Metal Assisted Chemical Etching

... chemical etching is a result of the competing effects of different factors, namely, deposited Ag-catalyzed Si dissolution, re-nucleated Ag- catalyzed Si dissolution, hole diffusion, and reactant diffu- sion ...

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Shear bond strength and debonding characteristics of a new premixed self-etching with a reference total-etch adhesive

Shear bond strength and debonding characteristics of a new premixed self-etching with a reference total-etch adhesive

... self- etching primers [19], but in contrast the self-etch system in our study (Tectosan) does not appear to increase the vulnerability to enamel defects: we did not find any cracks on tenfold ...

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FABRICATION OF DUAL- AND SINGLE-LAYER PIEZORESISTIVE MICROCANTILEVER SENSOR

FABRICATION OF DUAL- AND SINGLE-LAYER PIEZORESISTIVE MICROCANTILEVER SENSOR

... dry etching in microcantilever release have been widely used (Fang et ...wet etching, the fabrication cost is significantly reduced but common issues in the fabrication of the suspended microcantilever ...

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Morphological, structural and photoresponse characterization of ZnO nanostructure films deposited on plasma etched silicon substrates

Morphological, structural and photoresponse characterization of ZnO nanostructure films deposited on plasma etched silicon substrates

... The surface morphology, size, form and nanostructure affect the physical, chemical and electrical properties of thin films relative to the bulk behavior especially in semiconducting materials [1]. Recently a controlled ...

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Etching characteristics of Si{110} in 20 wt% KOH with addition of hydroxylamine for the fabrication of bulk micromachined MEMS

Etching characteristics of Si{110} in 20 wt% KOH with addition of hydroxylamine for the fabrication of bulk micromachined MEMS

... wet etching is a most widely employed for the fabrication of MEMS/NEMS structures using silicon bulk ...higher etch rate and provides improved anisotropy between Si{111} and Si{110} ...high etch rate ...

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Development Of Silicon-On-Insulator (SOI) Trapezoidal Waveguide Using Anisotropic Wet Etching

Development Of Silicon-On-Insulator (SOI) Trapezoidal Waveguide Using Anisotropic Wet Etching

... In silicon fabrication process, computer modeling and simulation has become a major part in predicting the performance of the waveguide due to fabrication parameter. Cost is the main problem why the real fabrication ...

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The Modelization of the Wet Etching Rate by the Segregation Boron and Phosphorus Distributions in Si/SiO2

The Modelization of the Wet Etching Rate by the Segregation Boron and Phosphorus Distributions in Si/SiO2

... the etch rate in non doped silicon dio- xide, and to deduce it for an n-doped and p-doped one through the parameter called “segregation proportionali- ...

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ICP Etching of Silicon for Micro and Nanoscale Devices

ICP Etching of Silicon for Micro and Nanoscale Devices

... achievable etch depth for a given forward ...maximum etch depth of around 100 ...of etch mask selectivity is seen from 130:1 to 80:1. Chemical etching is assumed since Fwd power, and DC bias, ...

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Influence of nanoscale surface roughness on flow behaviour in fluidic microchannels

Influence of nanoscale surface roughness on flow behaviour in fluidic microchannels

... chemical etching was successfully used in the early days of integrated circuit manufacturing, it has been largely replaced by plasma or dry etching due to two main ...often etch more vigorously than ...

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