RF magnetron-sputtered films
Suppression of the metal insulator transition in magnetron sputtered Ti2O3 films
25
Polycrystalline TiO2 Thin Films with Different Thicknesses Deposited on Unheated Substrates Using RF Magnetron Sputtering
6
Evaluation of Calcium Phosphate Coating Films on Titanium Fabricated Using RF Magnetron Sputtering
6
Studies on Structural And Optical Properties of DC Reactive Magnetron Sputtered Zro 2Thin Films
8
Study of The Structural and Optical Properties of Titanium dioxide Thin Films Prepared by RF Magnetron sputtering
5
Influence of Thickness on Optical and Sensing Properties of MgO Thin Films Deposited by RF Magnetron Sputtering
5
Effect of Sputtering Process Parameters on the Magnetron Sputtered Ni Ti Cu thin Films
5
Growth, Microstructure and Electrochemical Properties of RF Sputtered LiMn2O4 Thin Films on Au/Polyimide Flexible Substrates
6
Effects of post deposition annealing ambient on band alignment of RF magnetron sputtered Y2O3 film on gallium nitride
7
Evaluation of structure and material properties of RF magnetron sputter-deposited yttria-stabilized zirconia thin films
153
Influence of sputtering power on properties of titanium thin films deposited by RF magnetron sputtering
6
Annealing Effect of DC-RF Coupled Co-sputtered Boron-Aluminium Nitride Thin Films
5
Anticorrosion Behavior of Deposited Magnetite on Galvanized Steel in Saline Water Using RF-Magnetron Sputtering Nafeesa J. Kadhim1* Ahlam M. Farhan1 Harith I. Jaafer2
9
Control of the nanostructure and microtribology of magnetron sputtered surfaces
286
Nano structured morphological features of pulsed direct current magnetron sputtered Mo films for photovoltaic applications
28
NO2 Sensing Properties of Nano Structured ITO Thin Film
6
Al Doping Effect on the Surface Morphology of ZnO Films Grown by Reactive RF Magnetron Sputtering
7
Electrical Characteristics of Doped ZnO/Cu2O Heterojunction Diode by Sputtering Method
6
The microstructure and properties of unbalanced magnetron sputtered CrN[x] coatings
246
Effect of Heat Treatment on the Hardness of Ti Mo N Films Deposited by RF Reactive Magnetron Sputtering
7