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RF magnetron-sputtered films

Suppression of the metal insulator transition in magnetron sputtered Ti2O3 films

Suppression of the metal insulator transition in magnetron sputtered Ti2O3 films

... atmosphere. Reactive sputtering rate was monitored in-situ using an Inficon quartz crystal monitor. This allowed for estimation of the sample thickness and also ensured that deposition conditions were consistent. All ...

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Polycrystalline TiO2 Thin Films with Different Thicknesses Deposited on Unheated Substrates Using RF Magnetron Sputtering

Polycrystalline TiO2 Thin Films with Different Thicknesses Deposited on Unheated Substrates Using RF Magnetron Sputtering

... high-power sputtered plasma produces secondary electrons that bombard thin films or substrates, causing them to heat up, which makes accurately controlling their temperature ...

6

Evaluation of Calcium Phosphate Coating Films on Titanium Fabricated Using RF Magnetron Sputtering

Evaluation of Calcium Phosphate Coating Films on Titanium Fabricated Using RF Magnetron Sputtering

... the c-face. The thickness of the OAp and c-OAp films was approximately 0.5 mm; the thickness of the ACP film was either 0.5 mm or 1 mm, which was controlled by varying the deposition time. Figure 2 shows an example of the ...

6

Studies on Structural And Optical Properties of DC Reactive Magnetron Sputtered Zro 2Thin Films

Studies on Structural And Optical Properties of DC Reactive Magnetron Sputtered Zro 2Thin Films

... zirconium films [7], electron beam evaporation [8]-[10], pulsed laser deposition [11], vacuum arc deposition [12,13], DC magnetron sputtering [14,15], RF magnetron sputtering [16]-[20], ...

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Study of The Structural and Optical Properties
of Titanium dioxide Thin Films Prepared by RF
Magnetron sputtering

Study of The Structural and Optical Properties of Titanium dioxide Thin Films Prepared by RF Magnetron sputtering

... the sputtered particles on a substrate enables the deposition of a thin ...of magnetron cathodes is called magnetron sputtering which is widely used in both scientific and industrial ...A ...

5

Influence of Thickness on Optical and Sensing
Properties of MgO Thin Films Deposited by RF
Magnetron Sputtering

Influence of Thickness on Optical and Sensing Properties of MgO Thin Films Deposited by RF Magnetron Sputtering

... MgO thin films were prepared by RF magnetron sputtering system with a magnesium oxide target of 99.99% purity on quartz and (P + ) silicon as substrates. Firstly, the target was pre-sputtered ...

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Effect of Sputtering Process Parameters on the Magnetron Sputtered Ni Ti Cu thin Films

Effect of Sputtering Process Parameters on the Magnetron Sputtered Ni Ti Cu thin Films

... Ni-Ti-Cu films were successfully deposited and characterized by various modern ...thin films was dependent on the DC power of pure copper, nickel target and the RF power of the titanium .... ...

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Growth, Microstructure and Electrochemical Properties of RF Sputtered LiMn2O4 Thin Films on Au/Polyimide Flexible Substrates

Growth, Microstructure and Electrochemical Properties of RF Sputtered LiMn2O4 Thin Films on Au/Polyimide Flexible Substrates

... niques, RF magnetron sputtering technique is observed to be one of the most favorable and industrially viable tech- nique since it enables the formation of homogeneous films with definite thickness ...

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Effects of post deposition annealing ambient on band alignment of RF magnetron sputtered Y2O3 film on gallium nitride

Effects of post deposition annealing ambient on band alignment of RF magnetron sputtered Y2O3 film on gallium nitride

... commercially purchased Si-doped (n-type) GaN epitaxial layers with thickness of 7 μm and doping concentration of 1 to 9 × 10 18 cm −3 grown on sapphire substrates, the wafer, which was diced into smaller pieces, were ...

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Evaluation of structure and material properties of RF magnetron sputter-deposited yttria-stabilized zirconia thin films

Evaluation of structure and material properties of RF magnetron sputter-deposited yttria-stabilized zirconia thin films

... YSZ sputtered thin ...when films were exposed to ambient ...thin films sputtered with varying substrate bias power were exposed to ambient conditions and film stress was evaluated to ...

153

Influence of sputtering power on 
		properties of titanium thin films deposited by RF magnetron sputtering

Influence of sputtering power on properties of titanium thin films deposited by RF magnetron sputtering

... thin films were deposited on glass substrates by radio-frequency (RF) magnetron sputtering under various sputtering power (75-150W) at a relatively low temperature (200 ...the films were ...Ti ...

6

Annealing Effect of DC-RF Coupled Co-sputtered Boron-Aluminium Nitride Thin Films

Annealing Effect of DC-RF Coupled Co-sputtered Boron-Aluminium Nitride Thin Films

... Abstract —Boron (B) doped Aluminium Nitride (AlN) thin film ((B, Al)N) was synthesized by DC-RF coupled co-sputtering and post processed for three different annealing temperatures. The structural properties was ...

5

Anticorrosion Behavior of Deposited Magnetite on Galvanized Steel in Saline Water Using RF-Magnetron Sputtering

Nafeesa J. Kadhim1* Ahlam M. Farhan1 Harith I. Jaafer2

Anticorrosion Behavior of Deposited Magnetite on Galvanized Steel in Saline Water Using RF-Magnetron Sputtering Nafeesa J. Kadhim1* Ahlam M. Farhan1 Harith I. Jaafer2

... scanning electron microscopy (SEM) technique was a Hitachi S4160.More uniform grains may lead to more protection results, via the surface morphologies. Cross section have been analyzed via a Zeiss Supra 55VP ...

9

Control of the nanostructure and microtribology of magnetron sputtered surfaces

Control of the nanostructure and microtribology of magnetron sputtered surfaces

... Friction force as function of cycle number recorded in EG 3 at 50 % RH and v = 50 Ilmls on a hydrophilic sample and b hydrophobic surface ofnanostructure CR3-EG3... A.3 Examples of Analy[r] ...

286

Nano structured morphological features of pulsed direct current magnetron sputtered Mo films for photovoltaic applications

Nano structured morphological features of pulsed direct current magnetron sputtered Mo films for photovoltaic applications

... for films grown at 150 0 ...d.c. magnetron sputtered films, but their patterns were observed in the buckled portion of the films and with fairly large gain sizes > 5µm in length ...

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NO2 Sensing Properties of Nano Structured ITO Thin Film

NO2 Sensing Properties of Nano Structured ITO Thin Film

... ITO films with high conductivity and optical transparency over a wide spectral range were studied and ...the films has been done by .... Films deposited without annealing were amorphous and the ...

6

Al Doping Effect on the Surface Morphology of ZnO Films Grown by Reactive RF Magnetron Sputtering

Al Doping Effect on the Surface Morphology of ZnO Films Grown by Reactive RF Magnetron Sputtering

... ZnO films deposited onto silicon ...ZnO films grown by reactive DC magnetron sputtering, the grain size increases ...the films tend to be rougher, as discussed by Kajykawa [18], but with the ...

7

Electrical Characteristics of Doped ZnO/Cu2O Heterojunction Diode by Sputtering Method

Electrical Characteristics of Doped ZnO/Cu2O Heterojunction Diode by Sputtering Method

... [2] Tan, S. T., Chen, B. J., Sun, X. W., Fan, W. J., Kwok, H. S., Zhang, X. H., & Chua, S. J.(2005). Blueshift of Optical Band Gap in ZnO Thin Films Grown by Metal-Organic Chemical-Vapor Deposition. Journal of ...

6

The microstructure and properties of unbalanced magnetron sputtered CrN[x] coatings

The microstructure and properties of unbalanced magnetron sputtered CrN[x] coatings

... Within reactive magnetron sputtering of Cr targets in an argon/nitrogen atmosphere nitriding activity at the target surface occurs. As there is only marginal sputtering adjacent to the racetrack, nitrogen ...

246

Effect of Heat Treatment on the Hardness of Ti Mo N Films Deposited by RF Reactive Magnetron Sputtering

Effect of Heat Treatment on the Hardness of Ti Mo N Films Deposited by RF Reactive Magnetron Sputtering

... In the film deposited at fN2 ¼ 0:3 ccm N content 37 at%, the hardness significantly increased by heat treatment above 900 C due to the precipitation of the bcc phase in the matrix and a [r] ...

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