Atomic Layer Deposition (ALD)
Atomic Layer Deposition for Electrochemical Applications: Energy Storage and Corrosion Protection.
... Atomic layer deposition (ALD) is a vapor phase thin film deposition technique based on sequential, self-limiting surface half-reactions that are capable of conformally coating highly porous 3D ...
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Bi layer Channel AZO/ZnO Thin Film Transistors Fabricated by Atomic Layer Deposition Technique
... Atomic layer deposition (ALD) is a gas-phase thin film deposition technology characterized by the alternate exposure of chemical species with self-limiting surface reactions, providing ...
6
Atomic Layer Deposition and Controlling Film and Crystal Nucleation.
... Chemically functional microporous metal-organic framework (MOF) crystals are attractive for filtration and gas storage applications, and recent results show that they can be immobilized on high surface area substrates, ...
243
Atomic Layer Deposition for Dye-Sensitized Photovoltaic Cells.
... “atomic layer deposition” in topic, as of July 7th, ...the atomic layer deposition of a metal oxide using organometallic ( ● ) precursor and water ( ○ ) (Adapted from ...
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(Invited) Vacuum Ultraviolet Photochemical Atomic Layer Deposition of Alumina and Titania Films
... stimulate atomic layer deposition may be due to contributions from photo-thermal or photo-chemical mechanisms depending on the wavelength, incident power and chemistry of the ALD process in ...
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Atomic Layer Deposition for the Modification of Polymers and Carbon Nanotubes.
... vapor deposition 14,15 can lead to different surface terminations on the fiber mat top and ...fibers. Atomic layer deposition (ALD) can also modify polymer fibers and fiber mats by coating ...
219
Vacuum ultraviolet photochemical selective area atomic layer deposition of Al2O3 dielectrics
... Conventional atomic layer deposition (ALD) is a thermo-chemical process whereby pairs of reagents are sequentially pulsed in cycles onto a heated ...photo-assisted atomic layer ...
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The Atomic Layer Deposition of Noble Metals for Microelectronics Applications
... lately. Atomic layer deposition has been one of the fastest growing technologies for past decades due to its process nature of excellent conformality and thickness control ...and atomic force ...
143
Fabrication of low temperature solid oxide fuel cells with a nanothin protective layer by atomic layer deposition
... reason, atomic layer deposition (ALD) technique was employed to deposit a highly conformal and dense YSZ layer to minimize uncontrolled pinholes and/or morphological ...
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Surface modification of acetaminophen particles by atomic layer deposition
... Active pharmaceutical ingredients (APIs) are predominantly organic solid powders. Due to their bulk properties many APIs require processing to improve pharmaceutical formulation and manufacturing in the preparation for ...
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Atomic layer deposition of crystalline molybdenum oxide thin films and phase control by post-deposition annealing
... required. Atomic layer deposition (ALD) is an advanced gas phase thin fi lm deposition method, which relies on alternating self- limiting surface ...
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Functional Textiles via Self-assembled Nanolayers and Atomic Layer Deposition
... employ atomic layer deposition (ALD) on electrospun polymer fibers as a direct means by which to construct inorganic microtubes with well-defined nano-scale walls composed of Al 2 O 3 after the ...
271
Atomic Layer Deposition for Fiber Surface Modification and Nanosheet Fabrication.
... Atomic layer deposition (ALD) is a very effective thin film deposition technique for growing conformal inorganic or organic films with monolayer thickness on ...vapor deposition (CVD) ...
195
Atomic Layer Deposition on Fiber Forming Polymers and Nonwoven Fiber Structures.
... the atomic layer deposition process means that once saturation is achieved, the film growth rate is independent of the amount of precursor available for reaction, and atomic layer ...
388
Development of Nanomaterials for Lithium-Ion Batteries by Atomic Layer Deposition
... critical. Atomic layer deposition (ALD) strikes as a thin film deposition technique which is capable of depositing ultrathin, uniform, conformal and pinhole-free thin films over various ...
206
Optical and microstructural properties of ZnO/TiO2 nanolaminates prepared by atomic layer deposition
... vapor deposition, pulsed laser deposition, and co-sputtering ...layers, layer-to-layer consistency, and conformality. Atomic layer deposition (ALD) is more powerful in ...
5
Atomic Layer Deposition and Molecular Layer Deposition on Polymers.
... Molecular layer deposition (MLD) is a vapor phase deposition process, based on atomic layer deposition (ALD) which proceeds by exposing a surface to an alternating sequence of ...
397
Atomic Layer Deposition for the Modification and Creation of Nanomaterials.
... the deposition chamber is closed for a set “hold” time, increasing the net reactant ...from atomic layer deposition (ALD), which uses sequential, self-limiting reactant exposure steps to ...
177
Atomic Layer Deposition on Carbon Nanotubes and their Assemblies.
... addressed. Atomic layer deposition (ALD) is a versatile technique used to conformally deposit a wide variety of multifunctional materials onto complex micro- and nano-sized structures with ...
206
Effects of doping and annealing on properties of ZnO films grown by atomic layer deposition
... [9], atomic layer deposition (ALD) [10], magnetron sputte- ring [11], chemical vapor deposition [12], and pulsed laser deposition [13] have been adopted to deposit Al- doped ZnO ...
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