Reactive Sputtering
Preparation of N Doped TiOx Films as Photocatalyst Using Reactive Sputtering with Dry Air
... Depositions were performed using an RF magnetron reactive sputtering apparatus. A titanium disk (99.9% purity) of 75 mm in diameter was used as a target and a glass plate (28 48 1 mm) as a substrate. Prior ...
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Influence of Target Material on the Microstructure and Properties of Ti Si N Coatings Prepared by r f Reactive Sputtering
... modulus is mainly a function of Si content, although the target material was expected to be the determinant factor. The hardness increases with Si concentration, reaching a maximum value of 37 GPa in the range of 5 to 8 ...
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Microstructure and Properties of TiAlN/a C Nanocomposite Coatings Prepared by Reactive Sputtering
... TiAlN/a-C coatings have been prepared by pulsed d.c. and d.c reactive sputtering using 2 sets of TiAl and carbon targets in the FTS system. Evaluation of mechanical properties by submicron indentation and ...
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Electrochemical and Photoelectrochemical Properties of Nano Islands of Zinc and Niobium Oxides Deposited on Aluminum Thin Film by RF Magnetron Reactive Sputtering
... Al thin films were deposited on a glass (SCHOTT Nippon K.K., Glass code: D263T) substrate by a radio fre- quency (RF) magnetron sputtering (SHINKO SEIKI CO., LTD, Type: SRV4320), where the deposition time was ...
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Nanostructured CrAlN Films Prepared at Different Pulse Widths by Pulsed DC Reactive Sputtering in Facing Target Type System
... was used as the substrate. All the substrates were cleaned ultrasonically with acetone, ethanol, and 2-propanol, in this sequence, before sputtering deposition. The input power of pulsed DC, which was applied to ...
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Aluminum nitride films by reactive sputtering
... N2 Composition Figure 3-3 Affect of annealing on thickness 51 Figure 3-4 Affect of annealing on refractive index 52 Figure 3-5 Capacitance as a function of plate area 52 Figure 3-6 Optic[r] ...
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Functionalization of Ti-40Nb implant material with strontium by reactive sputtering
... Methods for preparation of strontium-releasing im- plant coatings involve hydro-thermal synthesis routes [15–17], Sr-substituted hydroxyapatite coating [21, 22], NaOH treatment followed by strontium acetate treat- ment ...
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Effect of Deposition Conditions on the Structure and Properties of CrAlN Films Prepared by Pulsed DC Reactive Sputtering in FTS Mode at High Al Content
... the films structure and phase formation have been investigated. XRD analyses were carried out to determine the phases of the films. The surface morphology was observed using FE-SEM. Transmission electron microscopy studies ...
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Effects of Titanium Sputtering Current on Structure and Morphology of TiZrN Films Prepared by Reactive DC Magnetron Co Sputtering
... as reactive sputtering [11], ion depositions from simultaneous magnetron are sources [14], and vac- uum arc deposition with combining of plasma flows ...
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Target Voltage Hysteresis Behavior and Control Point in the Preparation of Aluminum Oxide Thin Films by Medium Frequency Reactive Magnetron Sputtering
... During reactive magnetron sputtering, the target voltage changes as the variation of the flow rate of the reactive ...the reactive gas, ...Three sputtering modes exist under different ...
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Heteroepitaxial growth of TiN film on MgO (100) by reactive magnetron sputtering
... dc reactive sputtering is commonly used for deposition of polycrystalline and single-crystalline ...dc reactive magnetron sputtering of pure Ti [13-16]. Reactive radio-frequency (rf ) ...
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Target poisoning during CrN deposition by mixed high power impulse magnetron sputtering and unbalanced magnetron sputtering technique
... in reactive sputtering is well-known and has been studied in depth over the ...Magnetron Sputtering (HIPIMS), which have highly ionized plasmas of the depositing species (metal and gas ions), target ...
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Target poisoning during CrN deposition by mixed high power impulse magnetron sputtering and unbalanced magnetron sputtering technique
... in reactive sputtering is well-known and has been studied in depth over the ...magnetron sputtering (HIPIMS), which have highly ionized plasmas of the depositing species (metal and gas ions), target ...
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Advanced coatings through pulsed magnetron sputtering
... no reactive sputtering control system is required, and the complexities of rf matching networks are ...and sputtering can take place directly from the oxide blends with no evidence of arcing or ...
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Electrical properties of copper nitride thin film prepared by reactive DC sputtering
... Maruyama and Morishita (1995) produced conductive copper nitride thin film by RF magnetron reactive sputtering. They reported that the films with lattice constants above 3.868 Å were conductors, while films ...
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Optical properties and photoluminescence of copper nitride thin film prepared by reactive DC sputtering
... (DC) sputtering and have shown its potential use in maskless laser writing (Maya, ...by reactive DC sputtering as this technique has the following ...magnetron sputtering using ceramic target ...
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Collision spike Sputtering of Au Nanoparticles
... Ion irradiation of constrained systems, such as nanopar- ticles (NPs), nanostructured surfaces, or two-dimensional systems, has recently received increased interest [1]. Ion impact of NPs finds applications in the ...
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ZnO Films Deposited on Porous Silicon by DC Sputtering
... ZnO films were deposited onto porous silicon by a DC sputtering method and investigated mainly by means of XRD measurements. Two kinds of porous sili- con were engaged in this research. One was formed by the ...
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Planar Magnetron Sputtering Sources
... diode sputtering, not all of the electrons escaping the target contribute to the ionized plasma glow ...magnetron sputtering source addresses the electron problem by placing magnets behind, and sometimes, ...
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Sputtering studies of monocrystalline gold
... term sputtering was originally applied to the ejection of target atoms on bombardment of the target by energetic ions but now it also includes bombardment by energetic neutral ...of sputtering was by Grove ...
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