Sputtering Method
Characteristics of Ag Doped ZnO Thin Films Prepared by Sputtering Method
... Abstract: This paper presents the preparation of Ag-doped ZnO bulk sample by solid state reaction and Ag-doped ZnO thin films by sputtering method. The effects of doping concentration (1, 2 and 4%) on the ...
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Surface Modification of NaCl Particles with Metal Films Using the Polygonal Barrel Sputtering Method
... by sputtering with Au or Cu. Based on the obtained results, our sputtering method allows uniform surface modification of water-soluble and water-reactive powders that cannot be treated by ...
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Titanium Doped ITO Thin Films Produced by Sputtering Method
... Indium-tin-oxide (ITO) thin films are widely used as transparent conductive coating during the elaboration of optoelectronics devices such as liquid crystal displays (LCD), flat panel displays (FPD), 1) plasma displays, ...
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Copper Wires for High Speed Logic LSI Prepared by Low Pressure Long Throw Sputtering Method
... ducing Cu oxide. 0.2 µm BiCMOS LSI with Cu interconnect is demonstrated by using low pressure long throw sputtering method and 30% reduction of wiring delay is achieved by changing the material from ...
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Characterization Of Thin Film Nickel (Ni) Deposition By Sputtering Method
... deposition sputtering system is indicated by the invisibility of glow discharge plasma or ...the sputtering system. Results of the sputtering deposition process such as the thickness of the film ...
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Silicon self-assembled nanodots fabricated using a radio-frequency magnetron sputtering method
... The self-assembly growth of silicon nanodots on sapphire substrate was investigated, with highlights on the very early stage of nucleation and the growth process.. The scope of study c[r] ...
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Preparation of CuO Ta2O5 Composites Using a Simple Co Sputtering Method
... gas introduced into the processing vacuum chamber was 15 sccm, and the pressure in the chamber during depo- sition was kept at ~5.4 × 10 −4 Torr. RF power of 200 W was supplied to the target. A fused-silica plate (ATOCK ...
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Electrical Characteristics of Doped ZnO/Cu2O Heterojunction Diode by Sputtering Method
... using sputtering deposition method. The resistivity of both doped diodes Al:ZnO and Ga:ZnO was found to be lower than pure ZnO thin film. The present of dopant has increased the population of electrons ...
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-PARTICLE BASED SOLAR CELLS AFTER DEPOSITION OF METAL IN SPACES BETWEEN PARTICLES
... Copper coated TiO2 films were more efficient than uncoated TiO2 films in terms of photovoltaic activity. This may be the result of a well-developed metal-semiconductor junction (Schottky junction) hindering electron-hole ...
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Development of thin film photovoltaic cells based on low cost metal oxides
... a sputtering method with ceramic targets under different oxygen flows are measured by a UV-visible spectrophotometer as well, and the result is shown in ...
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Structural Properties of Hydroxyapatite (HA ) Thin Film on Ti-6Al-4V Alloy Prepared by Radio Frequency Plasma Sputtering
... data of HAp thin films formed on the surface of Ti- 6Al-4V alloy respectively. In spite of the existence α and β phases of Ti-6Al-4V alloy. The HAp thin films were built on whole surface of substrate. The uncoated ...
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The Structural and Electrical Properties of Nanostructures ZnO Thin Films on Flexible Substrate
... magnetron sputtering method is used to deposit ZnO thin films on flexible due to its advantages ability to produce a uniform thin film which is good in adhesion and highly ...magnetron sputtering as ...
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Surface Modification of Multiferroic BiFeO3 Ceramic by Argon Sputtering
... beam sputtering method can be eliminated by using the oxygen ambient during the sputtering ...s sputtering on the sample previously exposed in air shown in Figure 9(c) demonstrates again the ...
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Pulsed DC reactive magnetron sputtering of aluminum nitride thin films
... Figure 3-19 shows the XRD results of the aluminum nitride thin films on Si (100) with variations of nitrogen content when a 100 kHz/80% duty cycle was used. Total sputtering pressure of argon and nitrogen mixture ...
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Defect growth in multilayer chromium nitride/niobium nitride coatings produced by combined high power impulse magnetron sputtering and unbalance magnetron sputtering technique
... by sputtering from the bombardment of accelerated Cr ions, a complete removal of all surface imperfections is not achieved as the etching process itself is not meant to be very ...
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Effect of growth techniques on the structural, optical and electrical properties of indium doped TiO2thin films
... logarithmic plot of I-V characteristics for both samples. It can be seen from the figure that the reverse current of the sputtering sample is higher than that of PLD sample. In particular, the reverse bias leakage ...
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Influences of Process Condition of Magnetron Sputtering on Magnetostrictive Susceptibility of Fe2 2Sm Alloy Film
... DC-magnetron sputtering process, because the subsequent deposited particles rapidly ...the sputtering particles migrate the stable sites of the potential curve to form the ...
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Isotopic fractionation in sputtering
... The light isotope of Mo is found to suffer a 53±5% 0 note: 1.0 %o =0.1% enrichment in the sputtered flux in the near normal direction, compared to the steady state near normal sputtered [r] ...
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Influence of sputtering power on properties of titanium thin films deposited by RF magnetron sputtering
... magnetron sputtering (Arnell and Kelly, 1999), (Kelly and Arnell, 2000), (Savaloni et ...magnetron sputtering techniques are more preferable because it can be performed under lower temperature than the ...
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Sputtering studies of monocrystalline gold
... of sputtering, an aspect of ion-surface interaction, has been given by fusion reactor design considerations and lunar surface ...studies. Sputtering is the ejection of target atoms on bombardment by ...
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