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thin gate oxide film transistors

Indium Doping Concentration Effects in the Fabrication of Zinc-Oxide Thin-Film Transistors

Indium Doping Concentration Effects in the Fabrication of Zinc-Oxide Thin-Film Transistors

... Numerous studies of semiconductors conducted at the turn of the millennium have focused on wide-band-gap compound materials. These materials are of particular interest because of their transparency in the visible ...

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Electrical Performance and Stability of ZnO Thin-Film Transistors Incorporating Gadolinium Oxide High-k Dielectrics

Electrical Performance and Stability of ZnO Thin-Film Transistors Incorporating Gadolinium Oxide High-k Dielectrics

... of gate bias remains an issue [9-11]. This gate biased instability issue adds to another common form of instability reported in literature, resulting from ambient conditions after long time ...that ...

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Characterizing the electrical properties of raised S/D junctionless thin film transistors with a dual gate structure

Characterizing the electrical properties of raised S/D junctionless thin film transistors with a dual gate structure

... sacrificial oxide as a trimming process was ther- mally grown at 900°C for 2 h, which consumes around 22-nm-thick ...dry oxide of 20-nm thickness was deposited as the gate oxide layer, ...

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Fabrication of Amorphous Indium Gallium Zinc Oxide Thin Film Transistors by Focused Ion Beam

Fabrication of Amorphous Indium Gallium Zinc Oxide Thin Film Transistors by Focused Ion Beam

... The high mobility and large-area uniformity of α -IGZO makes it as the perfect material for the new-generation active-matrix backplane technology, especially in high- performance LCD and OLED displays which play ...

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Structural and electrical characteristics of high κ Er2O3 and Er2TiO5 gate dielectrics for a IGZO thin film transistors

Structural and electrical characteristics of high κ Er2O3 and Er2TiO5 gate dielectrics for a IGZO thin film transistors

... a gate oxide because of its large dielectric constant (approximately 14), wide bandgap energy (>5 eV), and high transparency in the visible range ...RE oxide films may be attributed to the oxygen ...

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Amorphous Indium Gallium Zinc Oxide Based Thin Film Transistors and Circuits.

Amorphous Indium Gallium Zinc Oxide Based Thin Film Transistors and Circuits.

... A 6.5 inch flexible full color AMOLED display on polymer substrate driven by a-IGZO TFTs was demonstrated by J. S. Park et al from Samsung Mobile displays in 2009 [67]. The individual a-IGZO TFTs exhibited a field-effect ...

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Huge on-Current Ferroelectric-Gate Thin Film Transistor with Solution-Processed Indium Tin Oxide Channel

Huge on-Current Ferroelectric-Gate Thin Film Transistor with Solution-Processed Indium Tin Oxide Channel

... Recently, oxide-semiconductor channel-based thin film transistors (TFTs) have been increasingly studied for large-area flat-panel displays and system-on-panel ...zinc oxide (IGZO) [9], ...

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Solution processed metal oxide dielectrics and semiconductors for thin film transistor applications

Solution processed metal oxide dielectrics and semiconductors for thin film transistor applications

... based thin film deposition techniques, spray pyrolysis seems to provide high performance ZnO-based ...The transistors were fabricated by methanol-based zinc acetate dihydrate solutions that was ...

297

Simulation of Digital Circuits based on Amorphous Indium Gallium Oxide Thin Film Transistors.

Simulation of Digital Circuits based on Amorphous Indium Gallium Oxide Thin Film Transistors.

... In the previous sections, a complete analysis of a-IGZO TFT inverter was done. This section takes a step further and discusses simulation results for digital circuits made using a-IGZO TFTs. A digital circuit is usually ...

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Amorphous Indium Gallium Zinc Oxide Thin-Film Transistors, Non-volatile Memory and Circuits for Transparent Electronics

Amorphous Indium Gallium Zinc Oxide Thin-Film Transistors, Non-volatile Memory and Circuits for Transparent Electronics

... The gate of the other TFT (T2) is connected to the source of T1, and the source of T2 is ...the gate of T2 and is biased into saturation, providing a low resistance path to ground for one terminal of the ...

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Influence of Extended Bias Stress on the Electrical Parameters of Mixed Oxide Thin Film Transistors

Influence of Extended Bias Stress on the Electrical Parameters of Mixed Oxide Thin Film Transistors

... Unlike previous studies done on TFTs, negative gate bias stress resulted in a positive shift in the threshold voltage. The variation in transfer characteristics with stress time is shown in Figure 2. The negative ...

5

Passivation of Amorphous Indium-Gallium-Zinc Oxide (IGZO) Thin-Film Transistors

Passivation of Amorphous Indium-Gallium-Zinc Oxide (IGZO) Thin-Film Transistors

... Figure 8 shows the saturation-mode transfer characteristics of Mo-contact TFTs which received different post-metal anneal treatments each with a ramp-down in air. The ramp-down rate was approximately constant, decreasing ...

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Aluminium oxide prepared by UV/ozone exposure for low-voltage organic thin-film transistors

Aluminium oxide prepared by UV/ozone exposure for low-voltage organic thin-film transistors

... a gate dielectric for low-voltage organic thin-film transistors based on an inorganic/organic bi-layer with a total thickness of up to ~ 20 ...aluminium oxide formed by UV/ozone ...

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Fabrication of Tin Oxide Thin Film Transistors by RF Magnetron Sputtering Using Sn/SnO Composite Target

Fabrication of Tin Oxide Thin Film Transistors by RF Magnetron Sputtering Using Sn/SnO Composite Target

... tin oxide thin films that are easier to manufacture than metallic target or ceramic ...tin oxide thin film with a Sn/SnO composite target showed very good transparency of ...tin ...

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The Influence of Hafnium Doping on Density of States in Zinc Oxide Thin Film Transistors Deposited via Atomic Layer Deposition

The Influence of Hafnium Doping on Density of States in Zinc Oxide Thin Film Transistors Deposited via Atomic Layer Deposition

... Bottom-gate TFTs were fabricated on a doped n-type Si wafer as shown in Fig. 1a. Before being placed in the ALD chamber, the Si substrates were cleaned with consecutive rinses of acetone, isopropyl alcohol, and ...

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Dielectric Gate Applications of PMMA-TiO2 Hybrid Films in ZnO-Based Thin Film Transistors

Dielectric Gate Applications of PMMA-TiO2 Hybrid Films in ZnO-Based Thin Film Transistors

... silicon oxide material ...silicon oxide, to provide high optical transparence, lower weight, mechanical flexibility and formability to the hybrid composite ...

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Influence of Plasma Treatment to the Performance of Amorphous IGZO based Flexible Thin Film Transistors

Influence of Plasma Treatment to the Performance of Amorphous IGZO based Flexible Thin Film Transistors

... silicon oxide which deposited with the same temperature continuously as a buffer layer for flexible ...bottom gate TFT structure is as shown in Figure ...silicon oxide. Then, a 250-nm silicon nitride ...

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Thin-film transistors fabricated using sputter deposition of zno

Thin-film transistors fabricated using sputter deposition of zno

... thermal oxide grown at 1000º C served as the gate dielectric ...ZnO thin film was deposited by sputtering for 600 seconds, with the settings specified in Table ...

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Diffusion-Controlled Faradaic Charge Storage in High-Performance Solid Electrolyte-Gated Zinc Oxide Thin-Film Transistors

Diffusion-Controlled Faradaic Charge Storage in High-Performance Solid Electrolyte-Gated Zinc Oxide Thin-Film Transistors

... presynaptic gate terminals in the vicinity of the channel region, where respective pre-spike and post spike signals can be applied on these gate ...multiple gate architecture, coupled to the channel ...

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Effects of Doped Stannum in the Fabrication of Zinc-Oxide Thin-Film Transistors

Effects of Doped Stannum in the Fabrication of Zinc-Oxide Thin-Film Transistors

... the film that was then annealed for 1 hour at 300 °C in ...the gate electrode followed by a shadow mask to define the source and drain, which were both plated with Al = 300 ...

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