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Metal gate

Investigation of induced charge damage on self-aligned metal-gate MOS devices

Investigation of induced charge damage on self-aligned metal-gate MOS devices

... on metal- gate NMOS ...LTO gate oxide with a self-aligned molybdenum gate ...the gate oxide during ...LTO gate oxide and TEOS ILD annealed at 600°C exhibits significant charge ...

101

Ru-based Gate Electrodes for Advanced Dual-Metal Gate CMOS Devices

Ru-based Gate Electrodes for Advanced Dual-Metal Gate CMOS Devices

... in gate-stack structures consisting of high-K gate dielectrics and metal gate ...transparent gate electrode materials will allow oxygen to penetrate through the gate electrode ...

257

Threshold Voltage Sensitivity to Metal Gate Work Function Based Performance Evaluation of Double Gate n FinFET Structures for LSTP Technology

Threshold Voltage Sensitivity to Metal Gate Work Function Based Performance Evaluation of Double Gate n FinFET Structures for LSTP Technology

... to metal gate work-function for n-channel double gate fin field-effect transistor (FinFET) structures and evaluates the short channel performance of the device using threshold voltage dependence on ...

6

Optimization of Metal Gate Electrode Stacks for Work Function Tuning

Optimization of Metal Gate Electrode Stacks for Work Function Tuning

... desirable metal gate should have an appropriate work function for NMOS or PMOS ...Dual metal gates or midgap metal gate electrodes can be used in CMOS processing however with a more ...

180

Electrical characteristic fluctuation of 16 nm gate high κ/metal gate bulk FinFET devices in the presence of random interface traps

Electrical characteristic fluctuation of 16 nm gate high κ/metal gate bulk FinFET devices in the presence of random interface traps

... For the last decades, the technology of silicon-based CMOS devices suffered significant fabrication challenges and sizeable characteristic variability [1-5]. Characteris- tics could be affected by various traps in ...

8

Fabrication and Evaluation of Devices Containing High K Gate Dielectrics and Metal Gate Electrodes for the 70 and 50NM Technology Nodes of ITRS

Fabrication and Evaluation of Devices Containing High K Gate Dielectrics and Metal Gate Electrodes for the 70 and 50NM Technology Nodes of ITRS

... and metal gate electrode becomes increasingly critical. Metal gate will eliminate the poly depletion effect and improve other issues such as increased gate resistance and boron ...Most ...

155

IMPLEMENTATION OF HIGH-K DIELECTRIC MATERIAL/METAL GATE IN DOUBLE GATE MOSFET

IMPLEMENTATION OF HIGH-K DIELECTRIC MATERIAL/METAL GATE IN DOUBLE GATE MOSFET

... Double gate MOSFET is designed using Cogenda’s 2-D Visual TCAD ...and metal gate is done for both gate stacking and direct application of high-k ...

8

Analytical Modeling and Simulation of Nanoscale Fully Depleted Dual Metal Gate SOI MOSFET

Analytical Modeling and Simulation of Nanoscale Fully Depleted Dual Metal Gate SOI MOSFET

... Material Gate (DMG) is one of such structure having a metal gate made with two dissimilar metals having different ...of metal used in the gate at source side for ...function ...

5

Metal Gate Process Refining Using Gate First And Gate Last Technology For 22nm N-MOSFET

Metal Gate Process Refining Using Gate First And Gate Last Technology For 22nm N-MOSFET

... teknologi gate-first dan gate-last. Pada awalnya, teknologi gate-first telah dimulakan oleh Sematech dan IBM-led Fishkill Alliance dan didapati mempunyai kelemahan dalam reka ...teknologi ...

24

Catalytic metal-gate field effect transistors based on SiC for indoor air quality control

Catalytic metal-gate field effect transistors based on SiC for indoor air quality control

... Metal insulator semiconductor field effect transistors (MIS- FETs) with catalytic metal-gate contacts were fabricated on top of 4 inch n-type 4H-SiC wafers by SenSiC AB, Sweden 1 . A p-type buffer ...

8

Investigation of High-k Dielectrics and Metal Gate Electrodes for 
Non-volatile Memory Applications.

Investigation of High-k Dielectrics and Metal Gate Electrodes for Non-volatile Memory Applications.

... For TEM analysis, blanket samples were prepared (no etching required) and were mechanically thinned down through ion-milling as per the sample requirements. Figure 5.19 shows the Z-contrast TEM image of the memory stack ...

247

Interface formation and thermal stability of advanced metal gate and ultrathin gate dielectric layers

Interface formation and thermal stability of advanced metal gate and ultrathin gate dielectric layers

... of gate electrode depletion, attention is being focused on advanced gate materials such as metallic titanium nitride 4–8 (TiN x ) as a possible replacement for heavily doped polycrystalline ...and ...

5

Impact of Structural Aspect, Metal Gate and Channel Material on UTB SOI MOSFET

Impact of Structural Aspect, Metal Gate and Channel Material on UTB SOI MOSFET

... Figure 1 Schematic diagram of UTB-SOI-n-MOSFET To meet the requirements of International Technology Roadmaps of semiconductors(ITRS),the structer had taken 45nm technology node [14]. According to ITRS[15] ,the drain bias ...

5

A Study of Group III Elements (La, Gd, Eu, and Al) Incorporation on Metal Gate / High–k Stacks for Advanced CMOS Applications

A Study of Group III Elements (La, Gd, Eu, and Al) Incorporation on Metal Gate / High–k Stacks for Advanced CMOS Applications

... each metal and three different alloy compositions were used as Ni (90%) – RE (10%), Ni (80%) – RE (20%) and Ni (70%) – RE ...The metal sputtering rates were also controlled so that the total metal ...

218

Fabrication and Device Characterization of Alternative Gate Stacks Using the Non Self-Aligned Gate Process

Fabrication and Device Characterization of Alternative Gate Stacks Using the Non Self-Aligned Gate Process

... The compatibility of poly-silicon gate on Hf silicate was examined and compared with metal gate electrode. Two major effects need to be considered: 1) thermal degradation during the high temperature ...

198

Interaction of Metal Gatew with High-K Gate Dielectrics in Advanced CMOS Devices

Interaction of Metal Gatew with High-K Gate Dielectrics in Advanced CMOS Devices

... [2] Hobbs, C.C.; Fonseca, L.R.C.; Knizhnik, A.; Dhandapani, V.; Samavedam, S.B.; Taylor, W.J.; Grant, J.M.; Dip, L.G.; Triyoso, D.H.; Hegde, R.I.; Gilmer, D.C.; Garcia, R.; Roan, D.; Lovejoy, M.L.; Rai, R.S.; Hebert, ...

258

Integration of Highly Strained SiGe in Source and Drain with HK and MG for 22 nm Bulk PMOS Transistors

Integration of Highly Strained SiGe in Source and Drain with HK and MG for 22 nm Bulk PMOS Transistors

... The integration of selective epitaxy of SiGe (0.35 ≤ × ≤ 0.40) in the source/drain areas and high-k and metal gate was demonstrated for 22 nm node PMOS device in this research. The quality of SiGe layers ...

7

Zero Temperature Coefficient Bias Point for Asymmetrical and Symmetrical Double Metal Double Gate MOSFETs

Zero Temperature Coefficient Bias Point for Asymmetrical and Symmetrical Double Metal Double Gate MOSFETs

... The metal gate work function tuned between ...[14]. Metal gate technology is used here due to their unique property of eliminating degradation in transistor ...for metal gate ...

10

Thermal Stability of Transition Metal Nitrides as NMOS Gate Electrodes

Thermal Stability of Transition Metal Nitrides as NMOS Gate Electrodes

... One of the required characteristics of a metal gate electrode for conventional process flow is thermal stability with the dielectric at temperatures of 900-1000ºC. Since refractory compounds such as ...

127

Electron Transport in Bulk-Si NMOSFETs in Presence of High-k Insulator-charge Trapping and Mobility

Electron Transport in Bulk-Si NMOSFETs in Presence of High-k Insulator-charge Trapping and Mobility

... metal gate screening of some of the soft phonon modes in the high-κ insulator by the ideal metal gate (TiN in this case) on ...a metal layer and a bulk non-polar semiconductor in a ...

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