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high-K gate dielectric

Analytical Modeling of Gate Tunneling Current through High-k Gate Dielectric

Analytical Modeling of Gate Tunneling Current through High-k Gate Dielectric

... of gate tunneling current for MOSFET structure (n-MOSFET, p-MOSFET) is ...for gate tunneling current density is better matched for various gate dielectrics ...large gate tunneling current ...

7

High-k Gate Dielectric Selection for Germanium-based CMOS Devices

High-k Gate Dielectric Selection for Germanium-based CMOS Devices

... relative closeness . The ranks are then specified in the last column. From Table 2, it is observed that La2O3 is the best highk material to be used as the gate dielectric in the Ge based CMOS ...

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Soft x-ray photoelectron spectroscopy of (HfO2)(x)(SiO2)(1-x) high-k gate-dielectric structures

Soft x-ray photoelectron spectroscopy of (HfO2)(x)(SiO2)(1-x) high-k gate-dielectric structures

... alternative dielectric and the silicon substrate that is free of SiO 2 and does not degrade FET performance by, for example, reducing channel mobility or trapping ...

6

High performance III V MOSFET with nano stacked high k gate dielectric and 3D fin shaped structure

High performance III V MOSFET with nano stacked high k gate dielectric and 3D fin shaped structure

... capacitance per unit area. The 3D III-V nMOSFET has a total gate width W/gate length L = 0.6:0.5 μm. The low value of the extracted channel mobility of the 3D III-V nMOSFET was possibly due to the ...

5

Device Performance Analysis of Graphene Nanoribbon Field Effect Transistor with Rare Earth Oxide (La2O3) Based High k Gate Dielectric

Device Performance Analysis of Graphene Nanoribbon Field Effect Transistor with Rare Earth Oxide (La2O3) Based High k Gate Dielectric

... neutrality point where the electron concentration is equal to the hole concentration. However, due to applied gate voltage the induced electrostatic potential changes the amount of charge carriers in GNR channel. ...

8

Lanthanide-based Oxides and Silicates for High-K Gate Dielectric Applications

Lanthanide-based Oxides and Silicates for High-K Gate Dielectric Applications

... metal gate work function is required to be ...the dielectric is shown to invoke such a voltage ...after high temperature annealing (1000 °C, 10 ...based dielectric interlayer reduces the ...

192

Computationally efficient quantum mechanical technique to calculate direct tunnelling gate leakage current in metal oxide semiconductor structures

Computationally efficient quantum mechanical technique to calculate direct tunnelling gate leakage current in metal oxide semiconductor structures

... tunneling gate current in MOS ...on dielectric layer thick- ness, we have suggested an easy way for estimating lifetimes in devices with thicker gate dielectrics where direct determi- nation is very ...

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Review Literature for Mosfet Devices Using High K

Review Literature for Mosfet Devices Using High K

... of high-k ...a high-k gate dielectric material with a good thermodynamic stability on Si or an ultrathin high-k interfacial blocking layer between the gate ...

8

Accurate modeling of gate capacitance in deep submicron MOSFETs with high K gate dielectrics

Accurate modeling of gate capacitance in deep submicron MOSFETs with high K gate dielectrics

... ultra-thin high-K gate-dielectric materials is calculated taking into account the penetration of wave functions into the ...the gate capacitance is independent of the dielectric ...

6

Device Fabrication and Characterization for Alternative Gate Stack Devices

Device Fabrication and Characterization for Alternative Gate Stack Devices

... the dielectric constants and the band offsets used to generate the contour is ...between K and band offset, which could be used to select the proper high-K materials for this ...known K ...

183

Improved electrical performance of a sol–gel IGZO transistor with high-k Al2O3 gate dielectric achieved by post annealing

Improved electrical performance of a sol–gel IGZO transistor with high-k Al2O3 gate dielectric achieved by post annealing

... We have explored the effect of post‑annealing on the electrical properties of an indium gallium zinc oxide (IGZO) transistor with an Al 2 O 3 bottom gate dielectric, formed by a sol–gel process. The ...

8

Electrical Properties of Ultrathin Hf Ti O Higher k Gate Dielectric Films and Their Application in ETSOI MOSFET

Electrical Properties of Ultrathin Hf Ti O Higher k Gate Dielectric Films and Their Application in ETSOI MOSFET

... a gate width/gate length of ...higher k gate dielectric, appropriate high k/Si interface processing technology, and metal ...the gate di- electric in NMOS capacitor ...

9

Electrical Characteristics Of High-K Dielectrics For The 19NM Gate Length NMOS Device

Electrical Characteristics Of High-K Dielectrics For The 19NM Gate Length NMOS Device

... metal gate with highk materials that have the ability to be integrated in MOSFET ...the high-K materials are compatible with silicon and also materials have too low or high ...

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Demonstration of hetero-gate-dielectric tunneling field-effect transistors (HG TFETs)

Demonstration of hetero-gate-dielectric tunneling field-effect transistors (HG TFETs)

... side gate insulator with high-k materials ...the gate insulator at the source side by using HF vapor improved enlargement of etched gate insulator ...the high-k layer on ...

15

Electrical characterization of different 
		high k dielectrics with tungsten silicide in vertical double gate NMOS 
		structure

Electrical characterization of different high k dielectrics with tungsten silicide in vertical double gate NMOS structure

... [6] H. Hussin, N. Soin, M.F. Bukhori, S.W.M. Hatta, Y.A. Wahab. 2014. Effects of Gate Stack Structural and Process Defectivity on High-k Dielectric Dependence of NBTI Reliability in 32 nm ...

8

Future MOSFET Devices using high k (TiO2) dielectric

Future MOSFET Devices using high k (TiO2) dielectric

... MOSFET device structure. The sub-threshold leakage current was found to be decreased with increasing threshold voltage; this reduces the power consumption and thus improves the device performance. The reduction in ...

8

Effect of High-k Gate on the functioning of MOSFET at nano meter sizes

Effect of High-k Gate on the functioning of MOSFET at nano meter sizes

... of k replacing the presently used material Silicon Di ...the Gate Oxide layer can be increased to reduce the Gate leakage ...the Gate Dielectric Capacitance has to be increased or ...

5

Variation in Parameters on Electrical Characteristics of FinFET with High-k dielectric

Variation in Parameters on Electrical Characteristics of FinFET with High-k dielectric

... Symmetric DG MOSFET is with two gates of identical work functions and asymmetric DG MOSFET with two gates of different work functions. To fully exploit the benefits of DG MOSFETs, the body of DG MOSFETs is usually ...

7

Characterization of High-k Gate Stacks in Metal-Oxide-Semiconductor Capacitors

Characterization of High-k Gate Stacks in Metal-Oxide-Semiconductor Capacitors

... and/or gate electrode interface to preserve interface-state characteristics and channel mobility ...a high-κ ...a high- κ material is expected to present a physical limit to the scaling of effective ...

171

Modeling of direct tunneling gate current and gate capacitance in deep submicron MOSFETs with high K dielectric

Modeling of direct tunneling gate current and gate capacitance in deep submicron MOSFETs with high K dielectric

... of gate dielectric thickness has ...equivalent gate oxide thickness of less than 2 nm will be required ...( gate length, oxide thickness etc) are scaled down and the substrate doping ...

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