High-k gate dielectrics
Fabrication and Evaluation of Devices Containing High K Gate Dielectrics and Metal Gate Electrodes for the 70 and 50NM Technology Nodes of ITRS
155
Investigation of MOS Interfaces with Atomic-Layer-Deposited High-k Gate Dielectrics on III-V Semiconductors.
222
Interaction of Metal Gatew with High-K Gate Dielectrics in Advanced CMOS Devices
258
Characterization of High-k gate dielectrics based on HfO2 and TiO2 for CMOS Application
106
Accurate modeling of gate capacitance in deep submicron MOSFETs with high K gate dielectrics
6
Reactions of High-k Gate Dielectrics: Studies in Hafnium, Zirconium, Yttrium, and Lanthanum-based Dielectrics and in-situ Infrared Results for Hafnium Dioxide Atomic Layer Deposition
238
High-k Gate Dielectric Selection for Germanium-based CMOS Devices
8
Manuscript Title & Authors
5
Characterization of High-k Dielectrics and Interfaces on Device Reliability
144
A Holistic Investigation of Alternative Gate Stack Materials for Future CMOS Applications
136
Transition from thermally grown gate dielectrics to deposited gate dielectrics for advanced silicon devices: A classification scheme based on bond ionicity
9
Device Fabrication and Characterization for Alternative Gate Stack Devices
183
Fixed Charge Reduction and Tunneling in Stacked Dielectrics
102
Electrical characterization of different high k dielectrics with tungsten silicide in vertical double gate NMOS structure
8
Reactions for Yttrium Silicate High-k Dielectrics
281
The interfaces of lanthanum oxide based subnanometer EOT gate dielectrics
5
Scrutiny of Leakage Currents with Insulating Materials for Transistor Applications
7
Lanthanide-based Oxides and Silicates for High-K Gate Dielectric Applications
192
Characterization of High-k Gate Stacks in Metal-Oxide-Semiconductor Capacitors
171
Polycrystallization effects on the nanoscale electrical properties of high k dielectrics
9